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ZnO-Al2O3-MgO sputtering target and method for the production thereof
It is known to produce a crystalline material consisting of ZnO-Al2O3-MgO (ZAMO) by dry mixing powders of raw material components comprising Al2O3, ZnO and MgO or precursors of these substances and sintering the powder mixtures so as to obtain the sputtering target. It is an object of the present invention to provide a target with high purity having 3N quality or better and which comprises no or small amounts of single phase consisting of Al2O3 and MgO. For that purpose it is proposed that said the step of mixing comprises a mixing of powders of the raw material components in a liquid, whereby the maximum solubility for said raw material powders in said liquid is less than 200 mg/kg and whereby said liquid used in the mixing step comprises water and whereby powder of MgCO3 is used as a precursor component for MgO. The obtained ZAMO sputtering target is characterized by a micro structure containing single component oxide phase consisting of either Al2O3 or of MgO in an amount of less than 1 % per weight, whereby the microstructure contains regions of single and binary phases of zincite, gahnite (ZnAlO4) and spinel (MgAlO4).
ZnO-Al2O3-MgO sputtering target and method for the production thereof
It is known to produce a crystalline material consisting of ZnO-Al2O3-MgO (ZAMO) by dry mixing powders of raw material components comprising Al2O3, ZnO and MgO or precursors of these substances and sintering the powder mixtures so as to obtain the sputtering target. It is an object of the present invention to provide a target with high purity having 3N quality or better and which comprises no or small amounts of single phase consisting of Al2O3 and MgO. For that purpose it is proposed that said the step of mixing comprises a mixing of powders of the raw material components in a liquid, whereby the maximum solubility for said raw material powders in said liquid is less than 200 mg/kg and whereby said liquid used in the mixing step comprises water and whereby powder of MgCO3 is used as a precursor component for MgO. The obtained ZAMO sputtering target is characterized by a micro structure containing single component oxide phase consisting of either Al2O3 or of MgO in an amount of less than 1 % per weight, whereby the microstructure contains regions of single and binary phases of zincite, gahnite (ZnAlO4) and spinel (MgAlO4).
ZnO-Al2O3-MgO sputtering target and method for the production thereof
HERZOG ANDREAS (Autor:in) / SIMONS CHRISTOPH (Autor:in)
28.10.2015
Patent
Elektronische Ressource
Englisch
Al2O3 Sputtering Target and Production Method Thereof
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