Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Sintering process of high-purity silicon oxide ceramic
The invention provides a sintering process of high-purity silicon oxide ceramic, which comprises the steps of ball milling, spray granulation, compression molding and isostatic pressing sintering; theisostatic pressing sintering process comprises the following steps: putting a compression molded alumina ceramic prefabricated part into a stainless steel container, and carrying out isostatic pressing treatment for 10-30 minutes at the temperature of 200-300 DEG C in an inert atmosphere and to prepare the high-purity silicon oxide. According to the sintering process of the high-purity silicon oxide ceramic, the isostatic pressing sintering process is adopted for treating the high-purity silicon oxide ceramic, isostatic pressure is effectively applied at the high temperature, and the high-purity silicon oxide ceramic can be sintered at the low sintering temperature (only 50%-60% of the melting point). The high-purity silicon oxide ceramic of which each phase is completely isotropic and each performance is remarkably improved is obtained in a short time, so that the process is an energy-saving, green and environment-friendly sintering process.
本发明提供一种高纯氧化硅烧结工艺，其包括球磨、喷雾造粒、压制成型以及等热静压烧结而成，其中热静压烧结工艺是将压制成型的氧化铝陶瓷预制件置于不锈钢容器中，并在惰性气氛中，温度为200‑300℃条件下等热静压处理10‑30mins，制得所述高纯氧化硅。本申请的高纯氧化硅陶瓷的烧结工艺采用等热静压烧结工艺处理高纯氧化硅陶瓷，有效地在高温下施加等静压力，能在较低的烧成温度(仅为熔点的50％～60％)下，且在较短的时间内得到各相完全同性、各项性能均有显著的提高的高纯氧化硅陶瓷，是一种节能绿色环保的烧结工艺。
Sintering process of high-purity silicon oxide ceramic
The invention provides a sintering process of high-purity silicon oxide ceramic, which comprises the steps of ball milling, spray granulation, compression molding and isostatic pressing sintering; theisostatic pressing sintering process comprises the following steps: putting a compression molded alumina ceramic prefabricated part into a stainless steel container, and carrying out isostatic pressing treatment for 10-30 minutes at the temperature of 200-300 DEG C in an inert atmosphere and to prepare the high-purity silicon oxide. According to the sintering process of the high-purity silicon oxide ceramic, the isostatic pressing sintering process is adopted for treating the high-purity silicon oxide ceramic, isostatic pressure is effectively applied at the high temperature, and the high-purity silicon oxide ceramic can be sintered at the low sintering temperature (only 50%-60% of the melting point). The high-purity silicon oxide ceramic of which each phase is completely isotropic and each performance is remarkably improved is obtained in a short time, so that the process is an energy-saving, green and environment-friendly sintering process.
本发明提供一种高纯氧化硅烧结工艺，其包括球磨、喷雾造粒、压制成型以及等热静压烧结而成，其中热静压烧结工艺是将压制成型的氧化铝陶瓷预制件置于不锈钢容器中，并在惰性气氛中，温度为200‑300℃条件下等热静压处理10‑30mins，制得所述高纯氧化硅。本申请的高纯氧化硅陶瓷的烧结工艺采用等热静压烧结工艺处理高纯氧化硅陶瓷，有效地在高温下施加等静压力，能在较低的烧成温度(仅为熔点的50％～60％)下，且在较短的时间内得到各相完全同性、各项性能均有显著的提高的高纯氧化硅陶瓷，是一种节能绿色环保的烧结工艺。
Sintering process of high-purity silicon oxide ceramic
一种高纯氧化硅陶瓷的烧结工艺
YAN LINGFU (Autor:in) / ZHU XIAOBIN (Autor:in) / DENG XIAOXING (Autor:in) / YING GUIHE (Autor:in) / YANG ZHIJUN (Autor:in) / DUAN CUIDAO (Autor:in) / WANG YUJIA (Autor:in)
22.01.2021
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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