Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
OPTICAL FUNCTIONAL FILM, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SPUTTERING TARGET
An optical functional film of the present invention contains a first component comprising at least one selected from TiC, NbC, VC, TiN, NbN and VN, and a second component comprising at least one selected from In2O3, Y2O3, Nb2O5, V2O5, Al2O3, ZnO and SiO2, and has a film thickness d of 30-100 nm, a refractive index n of 1.5-2.7 in a visible light region, and an extinction coefficient k of 0.3 or more in the visible light region.
本发明的光学功能膜含有由选自TiC、NbC、VC、TiN、NbN及VN中的一种以上组成的第一成分和由选自In2O3、Y2O3、Nb2O5、V2O5、Al2O3、ZnO及SiO2中的一种以上组成的第二成分，所述光学功能膜的膜厚d为30nm以上且100nm以下，可见光区域的折射率n为1.5以上且2.7以下，且可见光区域的消光系数k为0.3以上且1.5以下。
OPTICAL FUNCTIONAL FILM, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SPUTTERING TARGET
An optical functional film of the present invention contains a first component comprising at least one selected from TiC, NbC, VC, TiN, NbN and VN, and a second component comprising at least one selected from In2O3, Y2O3, Nb2O5, V2O5, Al2O3, ZnO and SiO2, and has a film thickness d of 30-100 nm, a refractive index n of 1.5-2.7 in a visible light region, and an extinction coefficient k of 0.3 or more in the visible light region.
本发明的光学功能膜含有由选自TiC、NbC、VC、TiN、NbN及VN中的一种以上组成的第一成分和由选自In2O3、Y2O3、Nb2O5、V2O5、Al2O3、ZnO及SiO2中的一种以上组成的第二成分，所述光学功能膜的膜厚d为30nm以上且100nm以下，可见光区域的折射率n为1.5以上且2.7以下，且可见光区域的消光系数k为0.3以上且1.5以下。
OPTICAL FUNCTIONAL FILM, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SPUTTERING TARGET
光学功能膜、溅射靶及溅射靶的制造方法
UMEMOTO KEITA (Autor:in) / SHIRAI TAKANORI (Autor:in) / SUGIUCHI YUKIYA (Autor:in) / OTOMO KENJI (Autor:in)
26.02.2021
Patent
Elektronische Ressource
Chinesisch
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