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Method for connecting polysilazane with silicon carbide
The invention belongs to the field of ceramic materials, and discloses a method for connecting polysilazane with silicon carbide. The method comprises the steps of smearing polysilazane on cleaned non-pressure silicon carbide substrates, then stacking two non-pressure silicon carbide substrates smeared with the polysilazane together in a smearing mode, and placing in a graphite crucible, applying 0.1 N axial force to a sample, heating the sample to 140 DEG C at the heating rate of 1 DEG C/min in the air environment, conducting heat preservation for 16-28 h, and conducting cross-linking curing; and placing a cross-linked and cured sample in a tubular furnace, applying 0.1 N axial force to the sample in a nitrogen atmosphere, heating to 240 DEG C at a heating rate of 1 DEG C/min, keeping the temperature for 1 h, then heating to 500 DEG C at the heating rate of 1 DEG C/min, keeping the temperature for 1 h, finally heating to 1300 DEG C at the heating rate of 1 DEG C/min, keeping the temperature for 2 h, and carrying out high-temperature sintering. The experimental connection method is simple to operate, and the sample can obtain higher connection strength.
本发明属于陶瓷材料领域,公开了一种聚硅氮烷连接碳化硅的方法。该方法是将聚硅氮烷涂抹在清洗过的无压碳化硅基底上,然后将两块涂抹了聚硅氮烷的无压碳化硅基底以涂抹叠放在一起,放在石墨坩埚中,对样品施加0.1N轴向力,空气环境下,以1℃/min升温速率,加热至140℃保温16‑28h,进行交联固化;交联固化后的样品置于管式炉中,氮气气氛下,对样品施加0.1N轴向力,以速率为1℃/min升温速率升温至240℃,保温1h,然后以1℃/min升温速率升温至500℃,保温1h,最后以1℃/min升温速率升温至1300℃,并保温2h进行高温烧结。本实验连接方法操作简单,且样品可获得较高的连接强度。
Method for connecting polysilazane with silicon carbide
The invention belongs to the field of ceramic materials, and discloses a method for connecting polysilazane with silicon carbide. The method comprises the steps of smearing polysilazane on cleaned non-pressure silicon carbide substrates, then stacking two non-pressure silicon carbide substrates smeared with the polysilazane together in a smearing mode, and placing in a graphite crucible, applying 0.1 N axial force to a sample, heating the sample to 140 DEG C at the heating rate of 1 DEG C/min in the air environment, conducting heat preservation for 16-28 h, and conducting cross-linking curing; and placing a cross-linked and cured sample in a tubular furnace, applying 0.1 N axial force to the sample in a nitrogen atmosphere, heating to 240 DEG C at a heating rate of 1 DEG C/min, keeping the temperature for 1 h, then heating to 500 DEG C at the heating rate of 1 DEG C/min, keeping the temperature for 1 h, finally heating to 1300 DEG C at the heating rate of 1 DEG C/min, keeping the temperature for 2 h, and carrying out high-temperature sintering. The experimental connection method is simple to operate, and the sample can obtain higher connection strength.
本发明属于陶瓷材料领域,公开了一种聚硅氮烷连接碳化硅的方法。该方法是将聚硅氮烷涂抹在清洗过的无压碳化硅基底上,然后将两块涂抹了聚硅氮烷的无压碳化硅基底以涂抹叠放在一起,放在石墨坩埚中,对样品施加0.1N轴向力,空气环境下,以1℃/min升温速率,加热至140℃保温16‑28h,进行交联固化;交联固化后的样品置于管式炉中,氮气气氛下,对样品施加0.1N轴向力,以速率为1℃/min升温速率升温至240℃,保温1h,然后以1℃/min升温速率升温至500℃,保温1h,最后以1℃/min升温速率升温至1300℃,并保温2h进行高温烧结。本实验连接方法操作简单,且样品可获得较高的连接强度。
Method for connecting polysilazane with silicon carbide
一种聚硅氮烷连接碳化硅的方法
CHENG YANLING (Autor:in) / HUANG HAOXIAN (Autor:in) / YANG SHENGKAI (Autor:in) / LEI JUN (Autor:in) / XI XINXIN (Autor:in) / GUO WEIMING (Autor:in) / LIN HUATAI (Autor:in)
24.09.2021
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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