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Method for treating silicon nitride ceramic through hot isostatic pressing
The invention relates to a method for treating silicon nitride ceramic through hot isostatic pressing. Specifically, silicon nitride ceramic is firstly placed in a muffle furnace, in-situ oxidation is carried out in an air atmosphere or an oxygen atmosphere to form an oxide layer on the surface of the silicon nitride ceramic, and then hot isostatic pressing treatment is carried out, so that the mechanical property of the silicon nitride ceramic is improved.
本发明涉及一种热等静压处理氮化硅陶瓷的方法。具体地,将氮化硅陶瓷先置于马弗炉中、在空气气氛或氧气气氛中进行原位氧化,以在氮化硅陶瓷表面形成氧化层,再进行热等静压处理,从而提高氮化硅陶瓷的力学性能。
Method for treating silicon nitride ceramic through hot isostatic pressing
The invention relates to a method for treating silicon nitride ceramic through hot isostatic pressing. Specifically, silicon nitride ceramic is firstly placed in a muffle furnace, in-situ oxidation is carried out in an air atmosphere or an oxygen atmosphere to form an oxide layer on the surface of the silicon nitride ceramic, and then hot isostatic pressing treatment is carried out, so that the mechanical property of the silicon nitride ceramic is improved.
本发明涉及一种热等静压处理氮化硅陶瓷的方法。具体地,将氮化硅陶瓷先置于马弗炉中、在空气气氛或氧气气氛中进行原位氧化,以在氮化硅陶瓷表面形成氧化层,再进行热等静压处理,从而提高氮化硅陶瓷的力学性能。
Method for treating silicon nitride ceramic through hot isostatic pressing
一种热等静压处理氮化硅陶瓷的方法
ZENG YUPING (Autor:in) / LIANG HANQIN (Autor:in) / XIA YONGFENG (Autor:in) / YAO DONGXU (Autor:in) / YIN JINWEI (Autor:in)
18.03.2022
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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