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Method for preparing metal carbide coating on surface of graphite device
The invention discloses a method for preparing a metal carbide coating on the surface of a graphite device, which comprises the following steps of: ionizing inert working gas under the action of an electric field to generate high-energy ions to bombard a metal target material, and depositing metal atoms on the surface of a substrate of the graphite device to form a thin film so as to obtain a compact metal coating; and the graphite device covered with the metal coating is placed in inert working gas to be heated to the first temperature, heat preservation is conducted, finally furnace cooling is conducted, and the graphite device with the compact metal carbide coating on the surface is obtained. According to the preparation method, magnetron sputtering of the metal tantalum coating and a high-temperature heating method are combined, the tantalum carbide coating with higher binding force is generated through high-temperature reaction of graphite and the tantalum film, the thickness of the coating is uniform and controllable, no harmful interface reaction occurs, and the preparation period is short; the invention further provides a method for preparing the composite coating through double-target sputtering.
本发明公开了一种在石墨器件表面制备金属碳化物涂层的方法,通过电场作用将惰性工作气体电离,产生高能离子轰击金属靶材,将金属原子沉积到石墨器件的衬底表面形成薄膜,以获得致密的金属涂层;将覆盖金属涂层的石墨器件置于惰性工作气体中加热至第一温度并保温,最后随炉冷却,得到表面具有致密金属碳化物涂层的石墨器件。本发明结合了磁控溅射金属钽涂层与高温加热法,利用石墨与钽薄膜的高温反应生成结合力更强的碳化钽涂层,涂层厚度均匀可控,无有害界面反应发生,制备的周期短;并提出了双靶材溅射制备复合涂层的方法。
Method for preparing metal carbide coating on surface of graphite device
The invention discloses a method for preparing a metal carbide coating on the surface of a graphite device, which comprises the following steps of: ionizing inert working gas under the action of an electric field to generate high-energy ions to bombard a metal target material, and depositing metal atoms on the surface of a substrate of the graphite device to form a thin film so as to obtain a compact metal coating; and the graphite device covered with the metal coating is placed in inert working gas to be heated to the first temperature, heat preservation is conducted, finally furnace cooling is conducted, and the graphite device with the compact metal carbide coating on the surface is obtained. According to the preparation method, magnetron sputtering of the metal tantalum coating and a high-temperature heating method are combined, the tantalum carbide coating with higher binding force is generated through high-temperature reaction of graphite and the tantalum film, the thickness of the coating is uniform and controllable, no harmful interface reaction occurs, and the preparation period is short; the invention further provides a method for preparing the composite coating through double-target sputtering.
本发明公开了一种在石墨器件表面制备金属碳化物涂层的方法,通过电场作用将惰性工作气体电离,产生高能离子轰击金属靶材,将金属原子沉积到石墨器件的衬底表面形成薄膜,以获得致密的金属涂层;将覆盖金属涂层的石墨器件置于惰性工作气体中加热至第一温度并保温,最后随炉冷却,得到表面具有致密金属碳化物涂层的石墨器件。本发明结合了磁控溅射金属钽涂层与高温加热法,利用石墨与钽薄膜的高温反应生成结合力更强的碳化钽涂层,涂层厚度均匀可控,无有害界面反应发生,制备的周期短;并提出了双靶材溅射制备复合涂层的方法。
Method for preparing metal carbide coating on surface of graphite device
一种在石墨器件表面制备金属碳化物涂层的方法
PI XIAODONG (Autor:in) / XU BINJIE (Autor:in) / WANG RONG (Autor:in) / XU SUOCHENG (Autor:in) / YANG DEREN (Autor:in)
11.11.2022
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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