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Graphite plate for improving uniformity of epitaxial structure and manufacturing method thereof
The invention provides a graphite plate for improving the uniformity of an epitaxial structure and a manufacturing method thereof, the graphite plate comprises a graphite plate body, the graphite plate body is provided with a plurality of grooves and pillars located at the edge areas of the bottoms of the grooves, and the height of the pillars is smaller than the depth of the grooves; and the heat insulation assembly at least covers the first surface of the supporting column, the side wall of the supporting column and the exposed side wall of the groove. Wherein the side wall of the groove of the graphite plate for placing the substrate and the first surface and the side wall of the support column are covered with the heat insulation assembly, so that the substrate is indirectly contacted with the graphite plate through the heat insulation assembly instead of being directly contacted with the graphite plate, and the temperature of the surface of the graphite plate cannot be directly transferred to the substrate; therefore, the heat transfer effect near the contact position between the substrate and the graphite disc and the support column is reduced, the temperature of the contact position is effectively reduced, the phenomenon that the local temperature is too high due to direct contact between the substrate and the graphite disc is avoided, and the problem that the wavelength consistency is poor due to temperature difference is solved.
本发明提供了一种用于改善外延结构均匀性的石墨盘及其制作方法,所述石墨盘包括:石墨盘本体,石墨盘本体上具有多个凹槽和位于凹槽底部边缘区域的支柱,且支柱的高度小于凹槽的深度;至少覆盖支柱的第一表面、支柱的侧壁以及凹槽暴露出的侧壁上的隔热组件。其中,在石墨盘放置衬底的凹槽的侧壁及支柱的第一表面和侧壁覆盖隔热组件,使得衬底不会直接接触到石墨盘,而是通过隔热组件间接与石墨盘接触,使得石墨盘表面的温度无法直接传递到衬底上,从而降低衬底与石墨盘及支柱接触的位置附近的热传递效果,有效降低接触位置的温度,避免了因衬底与石墨盘直接接触而导致的局域温度偏高这一现象,进而解决了温度差异导致波长一致性差的问题。
Graphite plate for improving uniformity of epitaxial structure and manufacturing method thereof
The invention provides a graphite plate for improving the uniformity of an epitaxial structure and a manufacturing method thereof, the graphite plate comprises a graphite plate body, the graphite plate body is provided with a plurality of grooves and pillars located at the edge areas of the bottoms of the grooves, and the height of the pillars is smaller than the depth of the grooves; and the heat insulation assembly at least covers the first surface of the supporting column, the side wall of the supporting column and the exposed side wall of the groove. Wherein the side wall of the groove of the graphite plate for placing the substrate and the first surface and the side wall of the support column are covered with the heat insulation assembly, so that the substrate is indirectly contacted with the graphite plate through the heat insulation assembly instead of being directly contacted with the graphite plate, and the temperature of the surface of the graphite plate cannot be directly transferred to the substrate; therefore, the heat transfer effect near the contact position between the substrate and the graphite disc and the support column is reduced, the temperature of the contact position is effectively reduced, the phenomenon that the local temperature is too high due to direct contact between the substrate and the graphite disc is avoided, and the problem that the wavelength consistency is poor due to temperature difference is solved.
本发明提供了一种用于改善外延结构均匀性的石墨盘及其制作方法,所述石墨盘包括:石墨盘本体,石墨盘本体上具有多个凹槽和位于凹槽底部边缘区域的支柱,且支柱的高度小于凹槽的深度;至少覆盖支柱的第一表面、支柱的侧壁以及凹槽暴露出的侧壁上的隔热组件。其中,在石墨盘放置衬底的凹槽的侧壁及支柱的第一表面和侧壁覆盖隔热组件,使得衬底不会直接接触到石墨盘,而是通过隔热组件间接与石墨盘接触,使得石墨盘表面的温度无法直接传递到衬底上,从而降低衬底与石墨盘及支柱接触的位置附近的热传递效果,有效降低接触位置的温度,避免了因衬底与石墨盘直接接触而导致的局域温度偏高这一现象,进而解决了温度差异导致波长一致性差的问题。
Graphite plate for improving uniformity of epitaxial structure and manufacturing method thereof
一种用于改善外延结构均匀性的石墨盘及其制作方法
HUANG JINDUI (Autor:in) / CHENG WEI (Autor:in) / ZHUO XIANGJING (Autor:in) / YAO GANG (Autor:in) / CHEN SHAOBIN (Autor:in)
20.01.2023
Patent
Elektronische Ressource
Chinesisch
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