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Ultrapure water supply apparatus, substrate processing system and method using same
The invention discloses an ultrapure water supply device. Comprising first filtering equipment, second filtering equipment, a first tank between the first filtering equipment and the second filtering equipment, third filtering equipment, a second tank between the second filtering equipment and the third filtering equipment, fourth filtering equipment and a third tank between the third filtering equipment and the fourth filtering equipment, and a gas supply device connected to each of the first to third tanks and configured to supply an inert gas. Each of the first to third tanks includes a tank body and a breather valve coupled to the tank body and connected to a storage space in the tank body. Each of the first to fourth filtration devices includes at least one selected from an activated carbon filtration device, an ion exchange resin device, a reverse osmosis membrane device, and a hollow fiber membrane device.
一种超纯水供应装置,包括:第一过滤设备、第二过滤设备、第一过滤设备与第二过滤设备之间的第一罐、第三过滤设备、第二过滤设备与第三过滤设备之间的第二罐、第四过滤设备、第三过滤设备与第四过滤设备之间的第三罐、以及连接到第一罐至第三罐中的每一个并被配置为供应惰性气体的气体供应设备。第一罐至第三罐中的每一个包括罐体和耦接到罐体并连接到罐体中的储存空间的呼吸阀。第一过滤设备至第四过滤设备中的每一个包括从活性炭过滤设备、离子交换树脂设备、反渗透膜设备和中空纤维膜设备中选择的至少一种。
Ultrapure water supply apparatus, substrate processing system and method using same
The invention discloses an ultrapure water supply device. Comprising first filtering equipment, second filtering equipment, a first tank between the first filtering equipment and the second filtering equipment, third filtering equipment, a second tank between the second filtering equipment and the third filtering equipment, fourth filtering equipment and a third tank between the third filtering equipment and the fourth filtering equipment, and a gas supply device connected to each of the first to third tanks and configured to supply an inert gas. Each of the first to third tanks includes a tank body and a breather valve coupled to the tank body and connected to a storage space in the tank body. Each of the first to fourth filtration devices includes at least one selected from an activated carbon filtration device, an ion exchange resin device, a reverse osmosis membrane device, and a hollow fiber membrane device.
一种超纯水供应装置,包括:第一过滤设备、第二过滤设备、第一过滤设备与第二过滤设备之间的第一罐、第三过滤设备、第二过滤设备与第三过滤设备之间的第二罐、第四过滤设备、第三过滤设备与第四过滤设备之间的第三罐、以及连接到第一罐至第三罐中的每一个并被配置为供应惰性气体的气体供应设备。第一罐至第三罐中的每一个包括罐体和耦接到罐体并连接到罐体中的储存空间的呼吸阀。第一过滤设备至第四过滤设备中的每一个包括从活性炭过滤设备、离子交换树脂设备、反渗透膜设备和中空纤维膜设备中选择的至少一种。
Ultrapure water supply apparatus, substrate processing system and method using same
超纯水供应装置、使用该装置的衬底处理系统和方法
YOON JONG-HA (Autor:in) / SON KWANG-WON (Autor:in) / JANG JI-EUN (Autor:in) / CHOI WOO-YOUNG (Autor:in) / PARK EUN-HYE (Autor:in)
29.09.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C02F
Behandlung von Wasser, Schmutzwasser, Abwasser oder von Abwasserschlamm
,
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
/
B01D
SEPARATION
,
Trennen
/
E03B
Anlagen oder Verfahren zum Gewinnen, Sammeln oder Verteilen von Wasser
,
INSTALLATIONS OR METHODS FOR OBTAINING, COLLECTING, OR DISTRIBUTING WATER
/
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
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