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Metal oxide target material and preparation method and application thereof
The invention provides a metal oxide target material and a preparation method and application thereof, and the preparation method comprises the following steps: mixing a metal oxide, a solvent and a binder to obtain a mixture, and compacting the mixture to obtain a green body; heating and degreasing the green body to obtain a degreased blank; and the degreased blank is subjected to die filling and vacuum hot pressing sintering, and the metal oxide target material is obtained. Wherein the vacuum hot pressing sintering comprises the steps of vacuumizing, primary heating, secondary heating and tertiary heating which are sequentially carried out, and pressurization is started when the primary heating reaches a first temperature; according to the preparation method, through mutual cooperation of the steps, the high-purity oxide target material with the density larger than or equal to 97% is prepared, and the target material is microscopic, uniform, compact, uniform, free of pores and excellent in sputtering performance.
本发明提供了一种金属氧化物靶材及其制备方法与应用,所述制备方法包括如下步骤:将金属氧化物、溶剂和粘结剂进行混合,得到混合料,将所述混合料进行压坯,得到生坯;将所述生胚进行加热脱脂,得到脱脂后坯;将所述脱脂后坯进行装模和真空热压烧结,得到所述金属氧化物靶材;其中,所述真空热压烧结包括依次进行的抽真空、一次升温、二次升温和三次升温,所述一次升温至第一温度时开始加压;所述制备方法通过步骤的相互配合,制备得到了致密度≥97%的高纯氧化物靶材,并且靶材不仅微观均匀致密,均匀无气孔,同时溅射性能优良。
Metal oxide target material and preparation method and application thereof
The invention provides a metal oxide target material and a preparation method and application thereof, and the preparation method comprises the following steps: mixing a metal oxide, a solvent and a binder to obtain a mixture, and compacting the mixture to obtain a green body; heating and degreasing the green body to obtain a degreased blank; and the degreased blank is subjected to die filling and vacuum hot pressing sintering, and the metal oxide target material is obtained. Wherein the vacuum hot pressing sintering comprises the steps of vacuumizing, primary heating, secondary heating and tertiary heating which are sequentially carried out, and pressurization is started when the primary heating reaches a first temperature; according to the preparation method, through mutual cooperation of the steps, the high-purity oxide target material with the density larger than or equal to 97% is prepared, and the target material is microscopic, uniform, compact, uniform, free of pores and excellent in sputtering performance.
本发明提供了一种金属氧化物靶材及其制备方法与应用,所述制备方法包括如下步骤:将金属氧化物、溶剂和粘结剂进行混合,得到混合料,将所述混合料进行压坯,得到生坯;将所述生胚进行加热脱脂,得到脱脂后坯;将所述脱脂后坯进行装模和真空热压烧结,得到所述金属氧化物靶材;其中,所述真空热压烧结包括依次进行的抽真空、一次升温、二次升温和三次升温,所述一次升温至第一温度时开始加压;所述制备方法通过步骤的相互配合,制备得到了致密度≥97%的高纯氧化物靶材,并且靶材不仅微观均匀致密,均匀无气孔,同时溅射性能优良。
Metal oxide target material and preparation method and application thereof
一种金属氧化物靶材及其制备方法与应用
YAO LIJUN (Autor:in) / PAN JIE (Autor:in) / YANG HUIZHEN (Autor:in) / LIAO PEIJUN (Autor:in) / ZHOU YOUPING (Autor:in)
03.10.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
G02F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING,...
,
Vorrichtungen oder Anordnungen, deren optische Arbeitsweise durch Änderung der optischen Eigenschaften des Mediums der Vorrichtungen oder Anordnungen geändert wird zum Steuern der Intensität, Farbe, Phase, Polarisation oder der Richtung von...
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