Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Composite structure, method for evaluating same, semiconductor, and display screen manufacturing device
Provided are: a ceramic coating layer having excellent particle resistance; and a method for evaluating the particle resistance of the ceramic coating layer. Specifically, the composite structure includes a base material and a structure provided on the base material and having a surface, the structure includes a polycrystalline ceramic, and the brightness Sa calculated by TEM image analysis satisfies a predetermined value. The present invention can be suitably used as an internal member of a semiconductor manufacturing device that requires particle resistance.
本发明提供一种抗粒子性出色的陶瓷涂层以及评价陶瓷涂层的抗粒子性的方法。具体而言，是一种包含基体材料及设置在所述基体材料上且具有表面的结构物的复合结构物，结构物包含多结晶陶瓷，将通过TEM图像解析算出的亮度Sa满足规定值的复合结构物，可作为要求具有抗粒子性的半导体制造装置的内部构件而适当加以使用。
Composite structure, method for evaluating same, semiconductor, and display screen manufacturing device
Provided are: a ceramic coating layer having excellent particle resistance; and a method for evaluating the particle resistance of the ceramic coating layer. Specifically, the composite structure includes a base material and a structure provided on the base material and having a surface, the structure includes a polycrystalline ceramic, and the brightness Sa calculated by TEM image analysis satisfies a predetermined value. The present invention can be suitably used as an internal member of a semiconductor manufacturing device that requires particle resistance.
本发明提供一种抗粒子性出色的陶瓷涂层以及评价陶瓷涂层的抗粒子性的方法。具体而言，是一种包含基体材料及设置在所述基体材料上且具有表面的结构物的复合结构物，结构物包含多结晶陶瓷，将通过TEM图像解析算出的亮度Sa满足规定值的复合结构物，可作为要求具有抗粒子性的半导体制造装置的内部构件而适当加以使用。
Composite structure, method for evaluating same, semiconductor, and display screen manufacturing device
复合结构物和其评价方法、半导体和显示屏制造装置
IWASAWA JUNICHI (Autor:in) / SERIZAWA HIROAKI (Autor:in) / WADA TAKUMA (Autor:in) / TAKIZAWA RYOTO (Autor:in) / AOSHIMA TOSHIHIRO (Autor:in) / TAKAHASHI YUKI (Autor:in) / KINJO ATSUSHI (Autor:in)
17.10.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
/
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
G01N
Untersuchen oder Analysieren von Stoffen durch Bestimmen ihrer chemischen oder physikalischen Eigenschaften
,
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
| Europäisches Patentamt | 2023
| Europäisches Patentamt | 2023
Europäisches Patentamt | 2020
| Europäisches Patentamt | 2019
| Europäisches Patentamt | 2020