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Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
A potassium sodium niobate sputtering target having a relative density of 95% or higher. A method of producing a potassium sodium niobate sputtering target, including the steps of mixing a Nb2O5powder, a K2Co3powder, and a Na2Co3powder, pulverizing the mixed powder to achieve a grain size d50of 100 µm or less, and performing hot press sintering to the obtained pulverized powder in an inert gas or vacuum atmosphere under conditions of a temperature of 900°C or higher and less than 1150°C, and a load of 150 to 400 kgf/cm2. The present invention aims to provide a high density potassium sodium niobate sputtering target capable of industrially depositing potassium sodium niobate films via the sputtering method.
POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
A potassium sodium niobate sputtering target having a relative density of 95% or higher. A method of producing a potassium sodium niobate sputtering target, including the steps of mixing a Nb2O5powder, a K2Co3powder, and a Na2Co3powder, pulverizing the mixed powder to achieve a grain size d50of 100 µm or less, and performing hot press sintering to the obtained pulverized powder in an inert gas or vacuum atmosphere under conditions of a temperature of 900°C or higher and less than 1150°C, and a load of 150 to 400 kgf/cm2. The present invention aims to provide a high density potassium sodium niobate sputtering target capable of industrially depositing potassium sodium niobate films via the sputtering method.
POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
KALIUMNATRIUMNIOBAT-SPUTTERTARGET UND VERFAHREN ZUR HERSTELLUNG DAVON
CIBLE DE PULVÉRISATION DE SODIUM NIOBATE DE POTASSIUM ET SON PROCÉDÉ DE PRODUCTION
SAKASHITA RYOSUKE (Autor:in) / TAKAMURA HIROSHI (Autor:in) / NARA ATSUSHI (Autor:in) / SUZUKI RYO (Autor:in)
19.07.2023
Patent
Elektronische Ressource
Englisch
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