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METHOD FOR PRODUCING SILICON NITRIDE SUBSTRATE
In a case of manufacturing a silicon nitride substrate by nitriding a stacked body made of a plurality of stacked sheet-shaped molded bodies each containing silicon, productivity of the silicon nitride substrate is improved. As means for this, a method of manufacturing the silicon nitride substrate is used, the method nitriding a stacked body made of 5 or more and 20 or less stacked sheet-shaped molded bodies each having a sheet shape and containing silicon by conveying the stacked body from a carry-in port to a carry-out port in a continuous heating furnace including the carry-in port, the carry-out port, a heating unit for heating a space between the carry-in port and the carry-out port, and a nitrogen supply unit for supplying nitrogen into the space between the carry-in port and the carry-out port.
METHOD FOR PRODUCING SILICON NITRIDE SUBSTRATE
In a case of manufacturing a silicon nitride substrate by nitriding a stacked body made of a plurality of stacked sheet-shaped molded bodies each containing silicon, productivity of the silicon nitride substrate is improved. As means for this, a method of manufacturing the silicon nitride substrate is used, the method nitriding a stacked body made of 5 or more and 20 or less stacked sheet-shaped molded bodies each having a sheet shape and containing silicon by conveying the stacked body from a carry-in port to a carry-out port in a continuous heating furnace including the carry-in port, the carry-out port, a heating unit for heating a space between the carry-in port and the carry-out port, and a nitrogen supply unit for supplying nitrogen into the space between the carry-in port and the carry-out port.
METHOD FOR PRODUCING SILICON NITRIDE SUBSTRATE
VERFAHREN ZUR HERSTELLUNG EINES SILICIUMNITRIDSUBSTRATS
PROCÉDÉ DE PRODUCTION D'UN SUBSTRAT EN NITRURE DE SILICIUM
SHIMADA KEI (Autor:in) / IMAMURA HISAYUKI (Autor:in)
05.02.2025
Patent
Elektronische Ressource
Englisch
Silicon nitride substrate and method for producing silicon nitride substrate
Europäisches Patentamt | 2017
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