Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
LOW REFLECTION MEMBER
PROBLEM TO BE SOLVED: To provide a low reflection member which is used during a light exposure treatment in a semiconductor manufacturing process and capable of enhancing light exposure precision by suppressing reflection of light.SOLUTION: There is provided a low reflection member consisting of an alumina sintered body having a lightness index of 45 or less and containing RAlOcrystal (R:Fe, Co, Ni) in a grain boundary between AlOcrystals. There is provided a low reflection member having AlOcrystal of 52 to 80 mass%, RAlOcrystal of 19 to 47 mass% and AlTiOcrystal of 1 to 5 mass% by content calculated by a Rietveld analysis.EFFECT: The low reflection member can enhance light exposure precision when it is used for a placing table of a substrate being an article to be treated, a wall material of a light exposure treatment region or the like, since it has a low reflection rate and can suppress light reflection.SELECTED DRAWING: None
【課題】半導体製造工程の露光処理時に用いるもので、光の反射を抑制して露光精度を向上させることができる低反射部材の提供。【解決手段】明度指数が45以下のアルミナ質焼結体からなり、Ａｌ２Ｏ３結晶間である粒界にＲＡｌ２Ｏ４結晶（Ｒ：Ｆｅ，Ｃｏ，Ｎｉ）を含む低反射部材。リートベルト解析により求められた含有量において、Ａｌ２Ｏ３結晶が５２〜８０質量％であり、ＲＡｌ２Ｏ４結晶が１９〜４７質量％であり、Ａｌ２ＴｉＯ５結晶が１〜５質量％である低反射部材。【効果】低反射部材は、反射率が低く、光の反射を抑制することができるため、被処理物である基板の載置台や露光処理領域の壁材等に用いれば、露光精度を向上させることができる。【選択図】なし
LOW REFLECTION MEMBER
PROBLEM TO BE SOLVED: To provide a low reflection member which is used during a light exposure treatment in a semiconductor manufacturing process and capable of enhancing light exposure precision by suppressing reflection of light.SOLUTION: There is provided a low reflection member consisting of an alumina sintered body having a lightness index of 45 or less and containing RAlOcrystal (R:Fe, Co, Ni) in a grain boundary between AlOcrystals. There is provided a low reflection member having AlOcrystal of 52 to 80 mass%, RAlOcrystal of 19 to 47 mass% and AlTiOcrystal of 1 to 5 mass% by content calculated by a Rietveld analysis.EFFECT: The low reflection member can enhance light exposure precision when it is used for a placing table of a substrate being an article to be treated, a wall material of a light exposure treatment region or the like, since it has a low reflection rate and can suppress light reflection.SELECTED DRAWING: None
【課題】半導体製造工程の露光処理時に用いるもので、光の反射を抑制して露光精度を向上させることができる低反射部材の提供。【解決手段】明度指数が45以下のアルミナ質焼結体からなり、Ａｌ２Ｏ３結晶間である粒界にＲＡｌ２Ｏ４結晶（Ｒ：Ｆｅ，Ｃｏ，Ｎｉ）を含む低反射部材。リートベルト解析により求められた含有量において、Ａｌ２Ｏ３結晶が５２〜８０質量％であり、ＲＡｌ２Ｏ４結晶が１９〜４７質量％であり、Ａｌ２ＴｉＯ５結晶が１〜５質量％である低反射部材。【効果】低反射部材は、反射率が低く、光の反射を抑制することができるため、被処理物である基板の載置台や露光処理領域の壁材等に用いれば、露光精度を向上させることができる。【選択図】なし
LOW REFLECTION MEMBER
低反射部材
TOYODA SATOSHI (Autor:in) / TAKENOSHITA HIDEHIRO (Autor:in)
11.04.2016
Patent
Elektronische Ressource
Japanisch
WAVE REFLECTION MEMBER AND METHOD OF CONSTRUCTING WAVE REFLECTION MEMBER
| Europäisches Patentamt | 2020