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OUTER PERIPHERAL COAT MATERIAL, JOINT MATERIAL, HONEYCOMB STRUCTURE AND METHOD FOR MANUFACTURING HONEYCOMB STRUCTURE
PROBLEM TO BE SOLVED: To provide an outer peripheral coat material capable of suppressing chlorine concentration and the possibility of generating corrosion of an exhaust system pipe line, etc..SOLUTION: An outer peripheral coat material is used for filling a recessed groove 10 formed on the outer peripheral surface 7 of a honeycomb sintered body 6, having a part of a cell 3a opened to the outside and extended in the axial direction and covering the outer peripheral surface to form an outer peripheral wall on the outer peripheral surface of a honeycomb structure, includes colloidal silica as a part of raw material to be used and has a chlorine concentration of 150 ppm or less. The chlorine concentration of the colloidal silica to be used is 500 ppm or less, and an acid used in the process of manufacturing the colloidal silica is at least one of sulfuric acid, phosphoric acid, acetic acid and organic acid.SELECTED DRAWING: Figure 3
【課題】塩素濃度を抑え、排気系配管等の腐食が発生する可能性を抑えた外周コート材が提供される。【解決手段】外周コート材は、ハニカム焼成体6の外周面7に形成され、セル3aの一部が外部に開口した軸方向に延びる凹溝10を充填するとともに外周面を覆い、ハニカム構造体の外周面に外周壁を形成するものであり、使用原料の一部にコロイダルシリカを含み、塩素濃度が150ppm以下である。更に、使用するコロイダルシリカの塩素濃度は、500ppm以下であり、コロイダルシリカの製造過程において使用される酸が、硫酸、燐酸、酢酸、及び有機酸の少なくともいずれか一つである。【選択図】図3
OUTER PERIPHERAL COAT MATERIAL, JOINT MATERIAL, HONEYCOMB STRUCTURE AND METHOD FOR MANUFACTURING HONEYCOMB STRUCTURE
PROBLEM TO BE SOLVED: To provide an outer peripheral coat material capable of suppressing chlorine concentration and the possibility of generating corrosion of an exhaust system pipe line, etc..SOLUTION: An outer peripheral coat material is used for filling a recessed groove 10 formed on the outer peripheral surface 7 of a honeycomb sintered body 6, having a part of a cell 3a opened to the outside and extended in the axial direction and covering the outer peripheral surface to form an outer peripheral wall on the outer peripheral surface of a honeycomb structure, includes colloidal silica as a part of raw material to be used and has a chlorine concentration of 150 ppm or less. The chlorine concentration of the colloidal silica to be used is 500 ppm or less, and an acid used in the process of manufacturing the colloidal silica is at least one of sulfuric acid, phosphoric acid, acetic acid and organic acid.SELECTED DRAWING: Figure 3
【課題】塩素濃度を抑え、排気系配管等の腐食が発生する可能性を抑えた外周コート材が提供される。【解決手段】外周コート材は、ハニカム焼成体6の外周面7に形成され、セル3aの一部が外部に開口した軸方向に延びる凹溝10を充填するとともに外周面を覆い、ハニカム構造体の外周面に外周壁を形成するものであり、使用原料の一部にコロイダルシリカを含み、塩素濃度が150ppm以下である。更に、使用するコロイダルシリカの塩素濃度は、500ppm以下であり、コロイダルシリカの製造過程において使用される酸が、硫酸、燐酸、酢酸、及び有機酸の少なくともいずれか一つである。【選択図】図3
OUTER PERIPHERAL COAT MATERIAL, JOINT MATERIAL, HONEYCOMB STRUCTURE AND METHOD FOR MANUFACTURING HONEYCOMB STRUCTURE
外周コート材、接合材、ハニカム構造体、及びハニカム構造体の製造方法
ONO YOHEI (Autor:in) / UCHIDA YASUSHI (Autor:in)
13.10.2016
Patent
Elektronische Ressource
Japanisch
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