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LITHIUM COBALTATE SINTERED COMPACT, SPUTTERING TARGET MANUFACTURED USING SAID SINTERED COMPACT, METHOD FOR PRODUCING LITHIUM COBALTATE SINTERED COMPACT, AND THIN FILM MADE OF LITHIUM COBALTATE
PROBLEM TO BE SOLVED: To provide a sputtering target that has a high strength and allows a stable sputtering, and a production method and thin film thereof.SOLUTION: The method for producing a sintered compact includes: spray drying a lithium cobaltate slurry to manufacture a granulated powder having an average particle size of 20 to 150 μm; cold pressing and/or CIP molding the granulated powder; and sintering the obtained molded compact in an atmosphere containing oxygen by 99 vol% or more at 1000 to 1100°C for 20 hours or more and 40 hours or less, to produce a sintered compact having a flexural strength of 100 MPa or more and an average value of bulk resistance of 100 Ω-cm or less.SELECTED DRAWING: None
【課題】強度が高く、安定したスパッタが可能なスパッタリングターゲット及びその製造方法並びに薄膜を提供する。【解決手段】コバルト酸リチウムスラリーをスプレードライして、平均粒径20〜150μmの造粒粉を作製し、造粒粉をコールドプレス及び/又はCIP成型し、得られた成型体を、酸素を99vol%以上含む雰囲気中、1000〜1100℃、20時間以上40時間以下で焼結する。曲げ強さが100MPa以上、バルク抵抗の平均値が100Ω・cm以下である焼結体の製造方法。【選択図】なし
LITHIUM COBALTATE SINTERED COMPACT, SPUTTERING TARGET MANUFACTURED USING SAID SINTERED COMPACT, METHOD FOR PRODUCING LITHIUM COBALTATE SINTERED COMPACT, AND THIN FILM MADE OF LITHIUM COBALTATE
PROBLEM TO BE SOLVED: To provide a sputtering target that has a high strength and allows a stable sputtering, and a production method and thin film thereof.SOLUTION: The method for producing a sintered compact includes: spray drying a lithium cobaltate slurry to manufacture a granulated powder having an average particle size of 20 to 150 μm; cold pressing and/or CIP molding the granulated powder; and sintering the obtained molded compact in an atmosphere containing oxygen by 99 vol% or more at 1000 to 1100°C for 20 hours or more and 40 hours or less, to produce a sintered compact having a flexural strength of 100 MPa or more and an average value of bulk resistance of 100 Ω-cm or less.SELECTED DRAWING: None
【課題】強度が高く、安定したスパッタが可能なスパッタリングターゲット及びその製造方法並びに薄膜を提供する。【解決手段】コバルト酸リチウムスラリーをスプレードライして、平均粒径20〜150μmの造粒粉を作製し、造粒粉をコールドプレス及び/又はCIP成型し、得られた成型体を、酸素を99vol%以上含む雰囲気中、1000〜1100℃、20時間以上40時間以下で焼結する。曲げ強さが100MPa以上、バルク抵抗の平均値が100Ω・cm以下である焼結体の製造方法。【選択図】なし
LITHIUM COBALTATE SINTERED COMPACT, SPUTTERING TARGET MANUFACTURED USING SAID SINTERED COMPACT, METHOD FOR PRODUCING LITHIUM COBALTATE SINTERED COMPACT, AND THIN FILM MADE OF LITHIUM COBALTATE
コバルト酸リチウム焼結体及び該焼結体を用いて作製されるスパッタリングターゲット及びコバルト酸リチウム焼結体の製造方法並びにコバルト酸リチウムからなる薄膜
ENDO YOSUKE (Autor:in) / SATO KAZUYUKI (Autor:in) / SUZUKI SATORU (Autor:in)
21.09.2017
Patent
Elektronische Ressource
Japanisch
IPC:
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
C04B
Kalk
,
LIME
/
H01M
Verfahren oder Mittel, z.B. Batterien, für die direkte Umwandlung von chemischer in elektrische Energie
,
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
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