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RARE EARTH OXIDE BASED CORROSION RESISTANT COATING FOR SEMICONDUCTOR APPLICATION
PROBLEM TO BE SOLVED: To provide a coating material resistant in plasma and used for a semiconductor manufacturing chamber.SOLUTION: An article includes a body coated with a ceramic coating. The ceramic coating includes YOof approximately 45 mol % to approximately 99 mol%, ZrOof approximately 0 mol% to approximately 55 mol% and AlOof approximately 0 mol% to approximately 10 mol% and can alternatively include YOof approximately 30 mol% to approximately 60 mol%, ZrOof approximately 0 mol% to approximately 20 mol% and AlOof approximately 30 mol% to approximately 60 mol%. The ceramic coating is preferably performed by a ceramic coater 104 including a plasma spray apparatus.SELECTED DRAWING: Figure 1
【課題】プラズマに耐性のある半導体製造チャンバ用コーティング材料を提供する。【解決手段】物品は、セラミックスコーティングでコーティングされる本体を含む。セラミックコーティングは、約４５モル％〜約９９モル％の範囲内のＹ２Ｏ３と、約０モル％〜約５５モル％の範囲内のＺｒＯ２と、約０モル％〜約１０モル％の範囲内のＡｌ２Ｏ３を含むことができる。セラミックコーティングは、代替的に、約３０モル％〜約６０モル％の範囲内のＹ２Ｏ３と、約０モル％〜約２０モル％の範囲内のＺｒＯ２と、約３０モル％〜約６０モル％の範囲内のＡｌ２Ｏ３を含むことができる。セラミックスコーティングはプラズマ溶射装置セラミックスコーター１０４により実施することが好ましい。【選択図】図１
RARE EARTH OXIDE BASED CORROSION RESISTANT COATING FOR SEMICONDUCTOR APPLICATION
PROBLEM TO BE SOLVED: To provide a coating material resistant in plasma and used for a semiconductor manufacturing chamber.SOLUTION: An article includes a body coated with a ceramic coating. The ceramic coating includes YOof approximately 45 mol % to approximately 99 mol%, ZrOof approximately 0 mol% to approximately 55 mol% and AlOof approximately 0 mol% to approximately 10 mol% and can alternatively include YOof approximately 30 mol% to approximately 60 mol%, ZrOof approximately 0 mol% to approximately 20 mol% and AlOof approximately 30 mol% to approximately 60 mol%. The ceramic coating is preferably performed by a ceramic coater 104 including a plasma spray apparatus.SELECTED DRAWING: Figure 1
【課題】プラズマに耐性のある半導体製造チャンバ用コーティング材料を提供する。【解決手段】物品は、セラミックスコーティングでコーティングされる本体を含む。セラミックコーティングは、約４５モル％〜約９９モル％の範囲内のＹ２Ｏ３と、約０モル％〜約５５モル％の範囲内のＺｒＯ２と、約０モル％〜約１０モル％の範囲内のＡｌ２Ｏ３を含むことができる。セラミックコーティングは、代替的に、約３０モル％〜約６０モル％の範囲内のＹ２Ｏ３と、約０モル％〜約２０モル％の範囲内のＺｒＯ２と、約３０モル％〜約６０モル％の範囲内のＡｌ２Ｏ３を含むことができる。セラミックスコーティングはプラズマ溶射装置セラミックスコーター１０４により実施することが好ましい。【選択図】図１
RARE EARTH OXIDE BASED CORROSION RESISTANT COATING FOR SEMICONDUCTOR APPLICATION
半導体アプリケーション用希土類酸化物系耐食性コーティング
JENNIFER Y SUN (Autor:in) / BIRAJA P KANUNGO (Autor:in) / TOM CHO (Autor:in)
15.03.2018
Patent
Elektronische Ressource
Japanisch
IPC:
B32B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
,
Schichtkörper, d.h. aus Ebenen oder gewölbten Schichten, z.B. mit zell- oder wabenförmiger Form, aufgebaute Erzeugnisse
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
C04B
Kalk
,
LIME
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