Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
RAIL POLISHING DEVICE
To well polish the flank of a head part of a rail.SOLUTION: A rail polishing device 10 includes a vehicle body 20 movable along a rail R, polishing materials 41, 42 that polish the flank of a head part R1 of the rail R, and a rotary driving source 46 that rotates the polishing materials 41, 42. Polishing surfaces 411 of the polishing materials 41, 42 for polishing the flank of the head part R1 of the rail R are supported so as to be swingable with respect to the rotation axis of the polishing materials 41, 42. Therefore, following bending and deformation of the flank of the head part of the rail, the polishing surfaces 411 of the polishing materials 41, 42 can be abutted and it is possible to polish well.SELECTED DRAWING: Figure 3
【課題】レール頭部の側面の良好な研磨を行う。【解決手段】レールＲに沿って移動可能な車体２０と、レールＲの頭部Ｒ１の側面を研磨する研磨材４１，４２と、研磨材４１，４２を回転させる回転駆動源４６とを備えるレール研磨装置１０において、研磨材４１，４２は、レールＲの頭部Ｒ１の側面を研磨する研磨面４１１が研磨材４１，４２の回転軸に対して揺動可能に支持されている。従って、レールの頭部の側面の湾曲や変形に追従して研磨材４１，４２の研磨面４１１を当接させることができ、良好な研磨を行うことができる。【選択図】図３
RAIL POLISHING DEVICE
To well polish the flank of a head part of a rail.SOLUTION: A rail polishing device 10 includes a vehicle body 20 movable along a rail R, polishing materials 41, 42 that polish the flank of a head part R1 of the rail R, and a rotary driving source 46 that rotates the polishing materials 41, 42. Polishing surfaces 411 of the polishing materials 41, 42 for polishing the flank of the head part R1 of the rail R are supported so as to be swingable with respect to the rotation axis of the polishing materials 41, 42. Therefore, following bending and deformation of the flank of the head part of the rail, the polishing surfaces 411 of the polishing materials 41, 42 can be abutted and it is possible to polish well.SELECTED DRAWING: Figure 3
【課題】レール頭部の側面の良好な研磨を行う。【解決手段】レールＲに沿って移動可能な車体２０と、レールＲの頭部Ｒ１の側面を研磨する研磨材４１，４２と、研磨材４１，４２を回転させる回転駆動源４６とを備えるレール研磨装置１０において、研磨材４１，４２は、レールＲの頭部Ｒ１の側面を研磨する研磨面４１１が研磨材４１，４２の回転軸に対して揺動可能に支持されている。従って、レールの頭部の側面の湾曲や変形に追従して研磨材４１，４２の研磨面４１１を当接させることができ、良好な研磨を行うことができる。【選択図】図３
RAIL POLISHING DEVICE
レール研磨装置
MUKAI AKIRA (Autor:in) / MIZUNO MASATOSHI (Autor:in) / YAMAZAKI SHIMIZU (Autor:in)
27.12.2018
Patent
Elektronische Ressource
Japanisch
RAIL POLISHING GRINDER HOLDING DEVICE AND RAIL POLISHING DEVICE
| Europäisches Patentamt | 2018