Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
RECHARGE SYSTEM AND RECHARGE METHOD
To provide a recharge system and a recharge method that can eliminate impurities in pumped underground water without using any chemical substance.SOLUTION: Target water W1 is made to be in touch with gas S including oxygen on the ground, and dissolved substances in the target water W1 are oxidized so as to be insoluble substances, and target water W2 is filtered by a filtering device 7 and the insoluble substances in the target water W2 are eliminated, and target water W4 after eliminating the insoluble substances is injected into the ground through a water injection well 6.SELECTED DRAWING: Figure 1
【課題】揚水した地下水中の不純物を化学物質を用いることなく除去することを可能にするリチャージシステム及びリチャージ工法を提供する。【解決手段】地上で対象水Ｗ１と酸素を含む気体Ｓとを接触させ、対象水Ｗ１中の溶存物質を酸化させて不溶性物質にし、該対象水Ｗ２をろ過装置７でろ過して対象水Ｗ２中の不溶性物質を除去し、不溶性物質を除去処理した後の対象水Ｗ４を注水井戸６から地中に注水する。【選択図】図１
RECHARGE SYSTEM AND RECHARGE METHOD
To provide a recharge system and a recharge method that can eliminate impurities in pumped underground water without using any chemical substance.SOLUTION: Target water W1 is made to be in touch with gas S including oxygen on the ground, and dissolved substances in the target water W1 are oxidized so as to be insoluble substances, and target water W2 is filtered by a filtering device 7 and the insoluble substances in the target water W2 are eliminated, and target water W4 after eliminating the insoluble substances is injected into the ground through a water injection well 6.SELECTED DRAWING: Figure 1
【課題】揚水した地下水中の不純物を化学物質を用いることなく除去することを可能にするリチャージシステム及びリチャージ工法を提供する。【解決手段】地上で対象水Ｗ１と酸素を含む気体Ｓとを接触させ、対象水Ｗ１中の溶存物質を酸化させて不溶性物質にし、該対象水Ｗ２をろ過装置７でろ過して対象水Ｗ２中の不溶性物質を除去し、不溶性物質を除去処理した後の対象水Ｗ４を注水井戸６から地中に注水する。【選択図】図１
RECHARGE SYSTEM AND RECHARGE METHOD
リチャージシステム及びリチャージ工法
ISHIKAWA AKIRA (Autor:in) / HAYASHI HIDEHIKO (Autor:in) / SERIZAWA SADAMI (Autor:in) / TAZAKI MASAHARU (Autor:in)
09.05.2019
Patent
Elektronische Ressource
Japanisch
IPC:
E02D
FOUNDATIONS
,
Gründungen
Recharge well structure and recharge construction method
| Europäisches Patentamt | 2023