Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
FILM STRUCTURE MANUFACTURING METHOD AND FILM STRUCTURE
To provide a film structure manufacturing method in which even a film structure manufactured using a vapor phase growth type film deposition method can comprise an internal structure.SOLUTION: The present invention relates to a method of forming a film structure by depositing a film on an outer periphery of a base material by a vapor phase growth type film deposition method and removing the base material after the film deposition. The method of forming the film structure comprises the processes of: repeating m times a process of depositing a film constituting an (n)th film structure on an outer periphery of an (n)th base material, and a process of forming an (n+1)th film structure including at least a part of the film constituting the (n)th film structure (n is a positive number increasing in order from 1 to m); forming an (m+1)th base material and then depositing a film constituting an (m+1)th film structure on an outer periphery thereof; and removing the first base material to the (m+1)th base material to obtain the film structure.SELECTED DRAWING: Figure 2
【課題】気相成長型の成膜法を用いて製造する膜構造体であっても、内部構造を備えることのできる膜構造体製造方法を提供する。【解決手段】気相成長型の成膜法により基材の外周に成膜を行い、成膜後に前記基材を除去することで膜構造体を形成する方法であって、第ｎ基材の外周に第ｎ膜構造体を構成する膜の成膜を成す工程と、前記第ｎ膜構造体を構成する膜の少なくとも一部を内包する第ｎ＋１基材を形成する工程と、をｍ回繰り返し（ｎは、１からｍまで順次繰り上がる正数）、第ｍ＋１基材を形成した後、その外周に第ｍ＋１膜構造体を構成する膜の成膜を成し、第１基材から前記第ｍ＋１基材までを除去して膜構造体を得る工程と、を有することを特徴とする膜構造体の製造方法。【選択図】図２
FILM STRUCTURE MANUFACTURING METHOD AND FILM STRUCTURE
To provide a film structure manufacturing method in which even a film structure manufactured using a vapor phase growth type film deposition method can comprise an internal structure.SOLUTION: The present invention relates to a method of forming a film structure by depositing a film on an outer periphery of a base material by a vapor phase growth type film deposition method and removing the base material after the film deposition. The method of forming the film structure comprises the processes of: repeating m times a process of depositing a film constituting an (n)th film structure on an outer periphery of an (n)th base material, and a process of forming an (n+1)th film structure including at least a part of the film constituting the (n)th film structure (n is a positive number increasing in order from 1 to m); forming an (m+1)th base material and then depositing a film constituting an (m+1)th film structure on an outer periphery thereof; and removing the first base material to the (m+1)th base material to obtain the film structure.SELECTED DRAWING: Figure 2
【課題】気相成長型の成膜法を用いて製造する膜構造体であっても、内部構造を備えることのできる膜構造体製造方法を提供する。【解決手段】気相成長型の成膜法により基材の外周に成膜を行い、成膜後に前記基材を除去することで膜構造体を形成する方法であって、第ｎ基材の外周に第ｎ膜構造体を構成する膜の成膜を成す工程と、前記第ｎ膜構造体を構成する膜の少なくとも一部を内包する第ｎ＋１基材を形成する工程と、をｍ回繰り返し（ｎは、１からｍまで順次繰り上がる正数）、第ｍ＋１基材を形成した後、その外周に第ｍ＋１膜構造体を構成する膜の成膜を成し、第１基材から前記第ｍ＋１基材までを除去して膜構造体を得る工程と、を有することを特徴とする膜構造体の製造方法。【選択図】図２
FILM STRUCTURE MANUFACTURING METHOD AND FILM STRUCTURE
膜構造体製造方法および膜構造体
KAWAMOTO SATOSHI (Autor:in)
03.09.2020
Patent
Elektronische Ressource
Japanisch
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