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DIELECTRIC THIN FILM, ELECTRONIC COMPONENT, THIN FILM CAPACITOR AND ELECTRONIC CIRCUIT BOARD
To provide a dielectric thin film having a high withstand voltage.SOLUTION: A dielectric thin film comprises an oxide having a perovskite structure. The oxide contains Bi, an element E1, an element E2 and Ti. The element E1 is at least one element selected from a group consisting of Na and K. The element E2 is at least one element selected from a group consisting of Ca, Sr and Ba. One crystal plane of the oxide is oriented in a normal direction of a surface of the dielectric thin film. The crystal plane is selected from a group consisting of (100) plane, (110) plane, and (111) plane. Each crystal plane has an orientation degree represented by a Harris texture coefficient. The orientation degree of any of the crystal plane is 1.6 to 2.5.SELECTED DRAWING: Figure 2
【課題】高い耐電圧を有する誘電体薄膜の提供。【解決手段】誘電体薄膜は、ペロブスカイト構造を有する酸化物を含み、酸化物が、Bi、元素E1、元素E2、及びTiを含み、元素E1が、Na及びKからなる群より選ばれる少なくとも一つの元素であり、元素E2が、Ca、Sr、及びBaからなる群より選ばれる少なくとも一つの元素であり、酸化物の一つの結晶面が、誘電体薄膜の表面の法線方向において配向しており、結晶面が、(100)面、(110)面、及び(111)面からなる群より選ばれ、各結晶面の配向度がHarris texture coefficientによって表され、いずれかの結晶面の配向度が1.6以上2.5以下である。【選択図】図2
DIELECTRIC THIN FILM, ELECTRONIC COMPONENT, THIN FILM CAPACITOR AND ELECTRONIC CIRCUIT BOARD
To provide a dielectric thin film having a high withstand voltage.SOLUTION: A dielectric thin film comprises an oxide having a perovskite structure. The oxide contains Bi, an element E1, an element E2 and Ti. The element E1 is at least one element selected from a group consisting of Na and K. The element E2 is at least one element selected from a group consisting of Ca, Sr and Ba. One crystal plane of the oxide is oriented in a normal direction of a surface of the dielectric thin film. The crystal plane is selected from a group consisting of (100) plane, (110) plane, and (111) plane. Each crystal plane has an orientation degree represented by a Harris texture coefficient. The orientation degree of any of the crystal plane is 1.6 to 2.5.SELECTED DRAWING: Figure 2
【課題】高い耐電圧を有する誘電体薄膜の提供。【解決手段】誘電体薄膜は、ペロブスカイト構造を有する酸化物を含み、酸化物が、Bi、元素E1、元素E2、及びTiを含み、元素E1が、Na及びKからなる群より選ばれる少なくとも一つの元素であり、元素E2が、Ca、Sr、及びBaからなる群より選ばれる少なくとも一つの元素であり、酸化物の一つの結晶面が、誘電体薄膜の表面の法線方向において配向しており、結晶面が、(100)面、(110)面、及び(111)面からなる群より選ばれ、各結晶面の配向度がHarris texture coefficientによって表され、いずれかの結晶面の配向度が1.6以上2.5以下である。【選択図】図2
DIELECTRIC THIN FILM, ELECTRONIC COMPONENT, THIN FILM CAPACITOR AND ELECTRONIC CIRCUIT BOARD
誘電体薄膜、電子部品、薄膜キャパシタ及び電子回路基板
TAKAHASHI KAZUKO (Autor:in) / OTSUKI SHIRO (Autor:in)
01.10.2020
Patent
Elektronische Ressource
Japanisch
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