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COATING MATERIAL HAVING INORGANIC COATING FILM, ITS MANUFACTURING METHOD AND MANUFACTURING APPARATUS
To provide a coating material excellent in adhesiveness to a base material and having a dense inorganic film, and to provide a method and an apparatus for manufacturing the same.SOLUTION: A coating material comprises a base material 22 and an inorganic coating film covering at least a part of a surface of the base material, and the inorganic coating film is composed of zirconium carbide having 16 atom% or less oxygen content or a composite material of zirconium carbide and silicon carbide. In a state where a vaporized matter of an organic compound containing a zirconium atom, or a mixture of the vaporized matter of the organic compound containing the zirconium atom and a vaporized matter of an organic compound containing a silicon atom is caused to stay on the surface of the base material, the coating material is formed by applying laser beam to the vaporized matter.SELECTED DRAWING: Figure 1
【課題】基材との密着性に優れ、緻密な無機被膜を有する被覆材及びその製造方法並びに製造装置を提供する。【解決手段】被覆材は、基材22と、該基材の表面の少なくとも一部を被覆する無機被膜とを備え、無機被膜は、酸素含有量が16原子%以下の炭化ジルコニウム、又は、炭化ジルコニウムと炭化珪素との複合材料からなる。被覆材は、ジルコニウム原子を含む有機化合物の気化物、又は、ジルコニウム原子を含む有機化合物の気化物及び珪素原子を含む有機化合物の気化物の混合物を基材の表面に滞留させた状態で、該気化物にレーザーを照射することにより形成される。【選択図】図1
COATING MATERIAL HAVING INORGANIC COATING FILM, ITS MANUFACTURING METHOD AND MANUFACTURING APPARATUS
To provide a coating material excellent in adhesiveness to a base material and having a dense inorganic film, and to provide a method and an apparatus for manufacturing the same.SOLUTION: A coating material comprises a base material 22 and an inorganic coating film covering at least a part of a surface of the base material, and the inorganic coating film is composed of zirconium carbide having 16 atom% or less oxygen content or a composite material of zirconium carbide and silicon carbide. In a state where a vaporized matter of an organic compound containing a zirconium atom, or a mixture of the vaporized matter of the organic compound containing the zirconium atom and a vaporized matter of an organic compound containing a silicon atom is caused to stay on the surface of the base material, the coating material is formed by applying laser beam to the vaporized matter.SELECTED DRAWING: Figure 1
【課題】基材との密着性に優れ、緻密な無機被膜を有する被覆材及びその製造方法並びに製造装置を提供する。【解決手段】被覆材は、基材22と、該基材の表面の少なくとも一部を被覆する無機被膜とを備え、無機被膜は、酸素含有量が16原子%以下の炭化ジルコニウム、又は、炭化ジルコニウムと炭化珪素との複合材料からなる。被覆材は、ジルコニウム原子を含む有機化合物の気化物、又は、ジルコニウム原子を含む有機化合物の気化物及び珪素原子を含む有機化合物の気化物の混合物を基材の表面に滞留させた状態で、該気化物にレーザーを照射することにより形成される。【選択図】図1
COATING MATERIAL HAVING INORGANIC COATING FILM, ITS MANUFACTURING METHOD AND MANUFACTURING APPARATUS
無機被膜を有する被覆材及びその製造方法並びに製造装置
KATSUI HIROKAZU (Autor:in) / HARADA MASAYOSHI (Autor:in)
24.12.2020
Patent
Elektronische Ressource
Japanisch
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