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    MEMBER FOR PLASMA PROCESSING DEVICE AND MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING DEVICE

    Neue Suche nach: ISHIKAWA SHIRO
    Neue Suche nach: KURATA YUTO
    Neue Suche nach: SHIONO ICHIRO
    Neue Suche nach: YASOJIMA TSUKASA
    Neue Suche nach: KATASE TAKUMA

    To provide an electrode plate for plasma processing device and manufacturing method, which has a heat transfer member excellent in heat resistance and plasma resistance and can achieve high thermal uniformity over a long period.SOLUTION: A member for plasma processing device includes a base material and a heat transfer layer formed on one surface of the base material. The heat transfer layer includes at least either one of fluorine-based resin and fluorine-based elastomer.SELECTED DRAWING: Figure 1

    【課題】耐熱性と耐プラズマに優れた伝熱材を備え、長期間にわたって高い均熱性を有するプラズマ処理装置用電極板及びその製造方法を提供する。【解決手段】プラズマ処理装置用部材は、プラズマ処理装置用部材であって、基材と、前記基材の一方の表面に設けられた伝熱層とを有しており、前記伝熱層は、フッ素系樹脂及びフッ素系エラストマーの少なくとも一方を含むことを特徴とする。【選択図】図１

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    MEMBER FOR PLASMA PROCESSING DEVICE AND MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING DEVICE

    Neue Suche nach: ISHIKAWA SHIRO
    Neue Suche nach: KURATA YUTO
    Neue Suche nach: SHIONO ICHIRO
    Neue Suche nach: YASOJIMA TSUKASA
    Neue Suche nach: KATASE TAKUMA

    To provide an electrode plate for plasma processing device and manufacturing method, which has a heat transfer member excellent in heat resistance and plasma resistance and can achieve high thermal uniformity over a long period.SOLUTION: A member for plasma processing device includes a base material and a heat transfer layer formed on one surface of the base material. The heat transfer layer includes at least either one of fluorine-based resin and fluorine-based elastomer.SELECTED DRAWING: Figure 1

    【課題】耐熱性と耐プラズマに優れた伝熱材を備え、長期間にわたって高い均熱性を有するプラズマ処理装置用電極板及びその製造方法を提供する。【解決手段】プラズマ処理装置用部材は、プラズマ処理装置用部材であって、基材と、前記基材の一方の表面に設けられた伝熱層とを有しており、前記伝熱層は、フッ素系樹脂及びフッ素系エラストマーの少なくとも一方を含むことを特徴とする。【選択図】図１

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    MEMBER FOR PLASMA PROCESSING DEVICE AND MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING DEVICE

    Neue Suche nach: ISHIKAWA SHIRO
    Neue Suche nach: KURATA YUTO
    Neue Suche nach: SHIONO ICHIRO
    Neue Suche nach: YASOJIMA TSUKASA
    Neue Suche nach: KATASE TAKUMA

    To provide an electrode plate for plasma processing device and manufacturing method, which has a heat transfer member excellent in heat resistance and plasma resistance and can achieve high thermal uniformity over a long period.SOLUTION: A member for plasma processing device includes a base material and a heat transfer layer formed on one surface of the base material. The heat transfer layer includes at least either one of fluorine-based resin and fluorine-based elastomer.SELECTED DRAWING: Figure 1

    【課題】耐熱性と耐プラズマに優れた伝熱材を備え、長期間にわたって高い均熱性を有するプラズマ処理装置用電極板及びその製造方法を提供する。【解決手段】プラズマ処理装置用部材は、プラズマ処理装置用部材であって、基材と、前記基材の一方の表面に設けられた伝熱層とを有しており、前記伝熱層は、フッ素系樹脂及びフッ素系エラストマーの少なくとも一方を含むことを特徴とする。【選択図】図１

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    Titel:

    MEMBER FOR PLASMA PROCESSING DEVICE AND MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING DEVICE

    Weitere Titelangaben:

    プラズマ処理装置用部材とその製造方法、及びプラズマ処理装置

    Beteiligte:

    ISHIKAWA SHIRO (Autor:in) / KURATA YUTO (Autor:in) / SHIONO ICHIRO (Autor:in) / YASOJIMA TSUKASA (Autor:in) / KATASE TAKUMA (Autor:in)

    Erscheinungsdatum:

    16.09.2021

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Japanisch

    Klassifikation:

    IPC:  H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / C04B Kalk , LIME

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