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SLATE-BASED TILE POLISHING DEVICE AND SLATE-BASED TILE POLISHING METHOD
To provide a slate-based tile polishing device which can polish a slate-based tile more properly and yet inhibit scattering of powder dust occurring during polishing.SOLUTION: A polishing device includes: a rotary brush which polishes a surface layer of a slate-based tile; and a cover which is provided so as to enclose a periphery of the rotary brush. The rotary brush has: a shaft part 31; and a brush 32 which is attached so as to extend outward from an outer peripheral surface of the shaft part 31. The shaft part 31 has: a large diameter shaft part 310; and a small diameter shaft part 311 having an outer diameter smaller than that of the large diameter shaft part 310. The brush 32 has: a small brush 320 which is attached to an outer periphery of the large diameter shaft part 310; and a large brush 321 which is attached to an outer periphery of the small diameter shaft part 311 and has an entire length longer than that of the small brush 320.SELECTED DRAWING: Figure 9
【課題】より的確に新生瓦を研磨することが可能でありながら、研磨の際に発生する粉塵の飛散を抑制することができる新生瓦の研磨装置を提供する。【解決手段】研磨装置は、新生瓦の表層を研磨する回転ブラシと、回転ブラシの周囲を囲うように設けられるカバーとを備える。回転ブラシは、軸部31と、軸部31の外周面から外側に向かって延びるように取り付けられるブラシ32と、を有する。軸部31は、大径軸部310と、大径軸部310よりも小さい外径を有する小径軸部311と、を有する。ブラシ32は、大径軸部310の外周に取り付けられる小ブラシ320と、小径軸部311の外周に取り付けられ、小ブラシ320よりも長い全長を有する大ブラシ321と、を有している。【選択図】図9
SLATE-BASED TILE POLISHING DEVICE AND SLATE-BASED TILE POLISHING METHOD
To provide a slate-based tile polishing device which can polish a slate-based tile more properly and yet inhibit scattering of powder dust occurring during polishing.SOLUTION: A polishing device includes: a rotary brush which polishes a surface layer of a slate-based tile; and a cover which is provided so as to enclose a periphery of the rotary brush. The rotary brush has: a shaft part 31; and a brush 32 which is attached so as to extend outward from an outer peripheral surface of the shaft part 31. The shaft part 31 has: a large diameter shaft part 310; and a small diameter shaft part 311 having an outer diameter smaller than that of the large diameter shaft part 310. The brush 32 has: a small brush 320 which is attached to an outer periphery of the large diameter shaft part 310; and a large brush 321 which is attached to an outer periphery of the small diameter shaft part 311 and has an entire length longer than that of the small brush 320.SELECTED DRAWING: Figure 9
【課題】より的確に新生瓦を研磨することが可能でありながら、研磨の際に発生する粉塵の飛散を抑制することができる新生瓦の研磨装置を提供する。【解決手段】研磨装置は、新生瓦の表層を研磨する回転ブラシと、回転ブラシの周囲を囲うように設けられるカバーとを備える。回転ブラシは、軸部31と、軸部31の外周面から外側に向かって延びるように取り付けられるブラシ32と、を有する。軸部31は、大径軸部310と、大径軸部310よりも小さい外径を有する小径軸部311と、を有する。ブラシ32は、大径軸部310の外周に取り付けられる小ブラシ320と、小径軸部311の外周に取り付けられ、小ブラシ320よりも長い全長を有する大ブラシ321と、を有している。【選択図】図9
SLATE-BASED TILE POLISHING DEVICE AND SLATE-BASED TILE POLISHING METHOD
新生瓦の研磨装置、新生瓦の研磨方法
ANZAI HIDEO (Autor:in)
26.01.2023
Patent
Elektronische Ressource
Japanisch