Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
To provide a base isolation mechanism which suppresses generation of excessive slide displacement and residual displacement.SOLUTION: A base isolation mechanism 1 includes: a base isolation device 40 which is installed between a pair of structures 11, 16 arranged being separated vertically, is fixed to one structure 16 of the pair of structures 11, 16, and is not fixed to the other structure 11 of the pair of structures; a device support part 30 which is fixed to a surface facing the other structure 11 of the base isolation device 40; a wall part 12 which is arranged being separated horizontally from the device support part 30, and is fixed to the other structure 11; a slide plate 20 which is fixed to a surface facing the device support part 30 of the other structure 11; a slide material 32 which is fixed to a surface facing the other structure 11 of the device support part 30, and can slide with respect to the slide plate 20; and a cushioning material 50 which is provided between the device support part 30 and the wall part 12.SELECTED DRAWING: Figure 1
【課題】過度な滑り変位及び残留変位が生じることを抑制する免震機構を提供する。【解決手段】免震機構１は、上下方向に離間して配置された一対の構造体１１，１６の間に設置され、一対の構造体１１，１６のいずれか一方１６に固定され、一対の構造体の他方１１に固定されていない免震装置４０と、免震装置４０の他方の構造体１１を向く面に固定された装置支持部３０と、装置支持部３０と水平方向に離間して配置され、他方の構造体１１に固定された壁部１２と、他方の構造体１１の装置支持部３０を向く面に固定された滑り板２０と、装置支持部３０の他方の構造体１１を向く面に固定され、滑り板２０に対して滑動可能な滑り材３２と、装置支持部３０と壁部１２との間に設けられた緩衝材５０と、を備える。【選択図】図１
To provide a base isolation mechanism which suppresses generation of excessive slide displacement and residual displacement.SOLUTION: A base isolation mechanism 1 includes: a base isolation device 40 which is installed between a pair of structures 11, 16 arranged being separated vertically, is fixed to one structure 16 of the pair of structures 11, 16, and is not fixed to the other structure 11 of the pair of structures; a device support part 30 which is fixed to a surface facing the other structure 11 of the base isolation device 40; a wall part 12 which is arranged being separated horizontally from the device support part 30, and is fixed to the other structure 11; a slide plate 20 which is fixed to a surface facing the device support part 30 of the other structure 11; a slide material 32 which is fixed to a surface facing the other structure 11 of the device support part 30, and can slide with respect to the slide plate 20; and a cushioning material 50 which is provided between the device support part 30 and the wall part 12.SELECTED DRAWING: Figure 1
【課題】過度な滑り変位及び残留変位が生じることを抑制する免震機構を提供する。【解決手段】免震機構１は、上下方向に離間して配置された一対の構造体１１，１６の間に設置され、一対の構造体１１，１６のいずれか一方１６に固定され、一対の構造体の他方１１に固定されていない免震装置４０と、免震装置４０の他方の構造体１１を向く面に固定された装置支持部３０と、装置支持部３０と水平方向に離間して配置され、他方の構造体１１に固定された壁部１２と、他方の構造体１１の装置支持部３０を向く面に固定された滑り板２０と、装置支持部３０の他方の構造体１１を向く面に固定され、滑り板２０に対して滑動可能な滑り材３２と、装置支持部３０と壁部１２との間に設けられた緩衝材５０と、を備える。【選択図】図１
BASE ISOLATION MECHANISM
免震機構
MURASE MITSURU (Autor:in)
13.10.2023
Patent
Elektronische Ressource
Japanisch
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