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CHEMICAL INJECTION SUPPORT DEVICE
To provide a chemical injection support device which can prevent permeation areas of chemical solution injected into the soil from the injection ports of adjacent injection pipes from separating even if the injection pipes are inclined against the planned value.SOLUTION: A chemical injection support device includes an acquisition part that acquires position information of injection ports that are formed in injection pipes inserted into insertion holes, and a derivation part that derives the injection amount of chemical solution for each of the injection ports, based on the position information acquired by the acquisition part, so that the permeation areas of the medical solution overlap.SELECTED DRAWING: Figure 9
【課題】注入管が計画値に対して傾斜している場合でも、隣り合う注入管の注入口から土壌に注入された薬液の浸透領域が離間してしまうのを抑制することができる薬液注入支援装置を得る。【解決手段】薬液注入支援装置は、挿入穴へ挿入された注入管に形成された注入口の位置情報を取得する取得部と、前記取得部が取得した位置情報に基づいて、薬液の浸透領域が重なるように、前記注入口毎に薬液の注入量を導出する導出部と、を備える。【選択図】図9
CHEMICAL INJECTION SUPPORT DEVICE
To provide a chemical injection support device which can prevent permeation areas of chemical solution injected into the soil from the injection ports of adjacent injection pipes from separating even if the injection pipes are inclined against the planned value.SOLUTION: A chemical injection support device includes an acquisition part that acquires position information of injection ports that are formed in injection pipes inserted into insertion holes, and a derivation part that derives the injection amount of chemical solution for each of the injection ports, based on the position information acquired by the acquisition part, so that the permeation areas of the medical solution overlap.SELECTED DRAWING: Figure 9
【課題】注入管が計画値に対して傾斜している場合でも、隣り合う注入管の注入口から土壌に注入された薬液の浸透領域が離間してしまうのを抑制することができる薬液注入支援装置を得る。【解決手段】薬液注入支援装置は、挿入穴へ挿入された注入管に形成された注入口の位置情報を取得する取得部と、前記取得部が取得した位置情報に基づいて、薬液の浸透領域が重なるように、前記注入口毎に薬液の注入量を導出する導出部と、を備える。【選択図】図9
CHEMICAL INJECTION SUPPORT DEVICE
薬液注入支援装置
ONISHI NAOHIRO (Autor:in) / NAKAJIMA TOMOHIRO (Autor:in) / KATAGIRI SHIGEKI (Autor:in) / KANEMITSU KATSURA (Autor:in) / UJIHARA MASAYUKI (Autor:in) / ITO TOSHIHIRO (Autor:in) / HATTORI YOSHIHIRO (Autor:in) / SASAKI TAKUYA (Autor:in) / OMURA NOZOMI (Autor:in) / HAYASHI MIZUKI (Autor:in)
16.01.2024
Patent
Elektronische Ressource
Japanisch
IPC:
E02D
FOUNDATIONS
,
Gründungen
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