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NON-POINT POLLUTION DECREASE APPARATUS
An apparatus for purifying non-point polluted water is disclosed. The water treatment apparatus according to the present invention consists of a settling tank (100), a buffer tank (200), a filtration tank (300), and a detention tank (400) that are separated by partition walls (W1 to W3). An inlet pipe (110) is installed on one side of the detention tank (100) and an outlet pipe (410) is installed on the other side of the detention tank (100). The first partition wall (W1) is installed between the settling tank (100) and the buffer tank (200), the second partition wall (W2) is installed between the buffer tank (200) and the filtration tank (300), and the third partition wall (W3) is installed between the filtration tank (300) and the detention tank (400). Upper portions of the first and third partition walls (W1, W3) are open, and a lower portion of the second partition wall (W2) is open. Contaminated water introduced into the settling tank (100) overflows to the upper portion of the first partition wall (W1), moves into the buffer tank (200), then moves to the filtration tank (300) through the lower portion of the second partition wall (W2), and then moves to the detention tank (400) through the upper portion of the third partition wall (W3).
비점 오염수를 정화하기 위한 장치가 개시된다. 본 발명에 따른 수처리 장치는 격벽(W1~W3)에 의해 구분되는 침전조(100), 버퍼조(200), 여과조(300), 저류조(400)로 이루어지고, 상기 침전조(100)의 일측에는 유입관(110)이 설치되며, 저류조의 타측에는 유출관(410)이 설치되고, 상기 침전조(100)와 버퍼조(200) 사이에는 제1 격벽(W1)이 설치되고, 상기 버퍼조(200)와 여과조(300) 사이에는 제2 격벽(W2)이 설치되며, 상기 여과조(300)와 저류조(400) 사이에는 제3 격벽(W1)이 설치되고, 상기 제1 및 제3 격벽(W1,W3)은 상부가 개방되고, 제2 격벽(W2)은 하부는 개방되며, 침전조(100)로 유입되는 오염수는 제1 격벽(W1)의 상부로 월류하여 버퍼조(200)로 이동한 후, 제2 격벽(W2)의 하부를 통해 여과조(300)로 이동한 다음, 제3 격벽(W3)의 상부를 통해 저류조(400)로 이동하도록 구성된다.
NON-POINT POLLUTION DECREASE APPARATUS
An apparatus for purifying non-point polluted water is disclosed. The water treatment apparatus according to the present invention consists of a settling tank (100), a buffer tank (200), a filtration tank (300), and a detention tank (400) that are separated by partition walls (W1 to W3). An inlet pipe (110) is installed on one side of the detention tank (100) and an outlet pipe (410) is installed on the other side of the detention tank (100). The first partition wall (W1) is installed between the settling tank (100) and the buffer tank (200), the second partition wall (W2) is installed between the buffer tank (200) and the filtration tank (300), and the third partition wall (W3) is installed between the filtration tank (300) and the detention tank (400). Upper portions of the first and third partition walls (W1, W3) are open, and a lower portion of the second partition wall (W2) is open. Contaminated water introduced into the settling tank (100) overflows to the upper portion of the first partition wall (W1), moves into the buffer tank (200), then moves to the filtration tank (300) through the lower portion of the second partition wall (W2), and then moves to the detention tank (400) through the upper portion of the third partition wall (W3).
비점 오염수를 정화하기 위한 장치가 개시된다. 본 발명에 따른 수처리 장치는 격벽(W1~W3)에 의해 구분되는 침전조(100), 버퍼조(200), 여과조(300), 저류조(400)로 이루어지고, 상기 침전조(100)의 일측에는 유입관(110)이 설치되며, 저류조의 타측에는 유출관(410)이 설치되고, 상기 침전조(100)와 버퍼조(200) 사이에는 제1 격벽(W1)이 설치되고, 상기 버퍼조(200)와 여과조(300) 사이에는 제2 격벽(W2)이 설치되며, 상기 여과조(300)와 저류조(400) 사이에는 제3 격벽(W1)이 설치되고, 상기 제1 및 제3 격벽(W1,W3)은 상부가 개방되고, 제2 격벽(W2)은 하부는 개방되며, 침전조(100)로 유입되는 오염수는 제1 격벽(W1)의 상부로 월류하여 버퍼조(200)로 이동한 후, 제2 격벽(W2)의 하부를 통해 여과조(300)로 이동한 다음, 제3 격벽(W3)의 상부를 통해 저류조(400)로 이동하도록 구성된다.
NON-POINT POLLUTION DECREASE APPARATUS
수처리 장치
AHN TAE HWAN (Autor:in) / CHOI BYOUNG JU (Autor:in)
22.07.2021
Patent
Elektronische Ressource
Koreanisch
NON-POINT POLLUTION DECREASE APPARATUS USING DIFFUSER
Europäisches Patentamt | 2020
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