THICK-FILM PASTES CONTAINING LEAD- AND TELLURIUM-OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES: Fid-Bau Portal

THICK-FILM PASTES CONTAINING LEAD- AND TELLURIUM-OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES

CARROLL ALAN FREDERICK / HANG KENNETH WARREN / LAUGHLIN BRIAN J / MIKESKA KURT RICHARD / TORARDI CARMINE / VERNOOY PAUL DOUGLAS

Abstract

본 발명은 하나 이상의 절연 층을 갖는 태양 전지 디바이스의 전면을 인쇄하기 위한 후막 페이스트를 제공한다. 후막 페이스트는 유기 매질 내에 분산된 전기 전도성 금속, 및 납-텔루륨-산화물을 포함한다.

The present invention provides a thick-film paste for printing the front-side of a solar cell device having one or more insulating layers. The thick-film paste comprises an electrically conductive metal, and a lead-tellurium-oxide dispersed in an organic medium.

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THICK-FILM PASTES CONTAINING LEAD- AND TELLURIUM-OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES

CARROLL ALAN FREDERICK / HANG KENNETH WARREN / LAUGHLIN BRIAN J / MIKESKA KURT RICHARD / TORARDI CARMINE / VERNOOY PAUL DOUGLAS

Abstract

THICK-FILM PASTES CONTAINING LEAD- AND TELLURIUM-OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES

CARROLL ALAN FREDERICK / HANG KENNETH WARREN / LAUGHLIN BRIAN J / MIKESKA KURT RICHARD / TORARDI CARMINE / VERNOOY PAUL DOUGLAS

Abstract

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Titel:

THICK-FILM PASTES CONTAINING LEAD- AND TELLURIUM-OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES

Weitere Titelangaben:

납- 및 텔루륨-산화물을 함유하는 후막 페이스트, 및 반도체 디바이스의 제조에 있어서의 그의 용도

Beteiligte:

CARROLL ALAN FREDERICK (Autor:in) / HANG KENNETH WARREN (Autor:in) / LAUGHLIN BRIAN J (Autor:in) / MIKESKA KURT RICHARD (Autor:in) / TORARDI CARMINE (Autor:in) / VERNOOY PAUL DOUGLAS (Autor:in)

Erscheinungsdatum:

27.11.2015

Medientyp:

Patent

Format:

Elektronische Ressource

Sprache:

Koreanisch

Klassifikation:

IPC: H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / C03C Chemische Zusammensetzungen für Gläser, Glasuren oder Emails , CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS / C04B Kalk , LIME

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