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    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    Neue Suche nach: KIM NAM YOUNG
    Neue Suche nach: WANG CONG
    Neue Suche nach: YAO ZHAO
    Neue Suche nach: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

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    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    Neue Suche nach: KIM NAM YOUNG
    Neue Suche nach: WANG CONG
    Neue Suche nach: YAO ZHAO
    Neue Suche nach: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

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    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    Neue Suche nach: KIM NAM YOUNG
    Neue Suche nach: WANG CONG
    Neue Suche nach: YAO ZHAO
    Neue Suche nach: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

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    Titel:

    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    Weitere Titelangaben:

    티탄산 바륨 박막 및 티탄산 바륨 박막의 제조 방법

    Beteiligte:

    KIM NAM YOUNG (Autor:in) / WANG CONG (Autor:in) / YAO ZHAO (Autor:in) / LI YANG (Autor:in)

    Erscheinungsdatum:

    09.08.2016

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Koreanisch

    Klassifikation:

    IPC:  C01G Verbindungen der von den Unterklassen C01D oder C01F nicht umfassten Metalle , COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F / C04B Kalk , LIME

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