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    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    New search for: KIM NAM YOUNG
    New search for: WANG CONG
    New search for: YAO ZHAO
    New search for: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

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    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    New search for: KIM NAM YOUNG
    New search for: WANG CONG
    New search for: YAO ZHAO
    New search for: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

    Access

    Download

    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    New search for: KIM NAM YOUNG
    New search for: WANG CONG
    New search for: YAO ZHAO
    New search for: LI YANG

    Disclosed are a barium titanate (BaTiO_3) thin film, and a manufacturing method of a BaTiO_3 thin film. According to an aspect of the present invention, the BaTiO_3 thin film has a root mean square value of surface roughness of 18 or more to 20 or less nm. The BaTiO_3 thin film has enhanced surface roughness after an etching process. The manufacturing method of the BaTiO_3 thin film has an enhanced etching speed.

    티탄산 바륨(BaTiO) 박막 및 티탄산 바륨 박막의 제조 방법이 개시된다. 본 발명의 일 측면에 따른 티탄산 바륨(BaTiO) 박막은 표면 거칠기에 대한 제곱평균제곱근(RMS)이 18nm이상 20nm이하로 형성된다.

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    Title:

    BARIUM TITANATE THIN FILM AND BARIUM TITANATE THIN FILM MANUFACTURING METHOD

    Additional title:

    티탄산 바륨 박막 및 티탄산 바륨 박막의 제조 방법

    Contributors:

    KIM NAM YOUNG (author) / WANG CONG (author) / YAO ZHAO (author) / LI YANG (author)

    Publication date:

    2016-08-09

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    Korean

    Classification:

    IPC:  C01G Verbindungen der von den Unterklassen C01D oder C01F nicht umfassten Metalle , COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F / C04B Kalk , LIME

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