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Oriented alumina substrate for epitaxial growth
An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 0.1° or more and less than 1.0° and an average sintered grain size of 10 μm or more.
Oriented alumina substrate for epitaxial growth
An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 0.1° or more and less than 1.0° and an average sintered grain size of 10 μm or more.
Oriented alumina substrate for epitaxial growth
WATANABE MORIMICHI (Autor:in) / SATO KEI (Autor:in) / MATSUSHIMA KIYOSHI (Autor:in) / NANATAKI TSUTOMU (Autor:in)
08.10.2019
Patent
Elektronische Ressource
Englisch
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