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Piezoelectric ceramic sputtering target, lead-free piezoelectric thin film and piezoelectric thin film element using the same
A piezoelectric ceramic sputtering target containing a perovskite type oxide represented by chemical formula (I) of ABO3 as a main component, wherein the component A of the chemical formula (I) contains at least K (potassium) and/or Na (sodium), the component B of the chemical formula (I) contains at least Nb (niobium), the piezoelectric ceramic sputtering target is composed of a plurality of crystal grains; and the average particle diameter of the crystal grains is larger than 3 μm and not larger than 30 μm.
Piezoelectric ceramic sputtering target, lead-free piezoelectric thin film and piezoelectric thin film element using the same
A piezoelectric ceramic sputtering target containing a perovskite type oxide represented by chemical formula (I) of ABO3 as a main component, wherein the component A of the chemical formula (I) contains at least K (potassium) and/or Na (sodium), the component B of the chemical formula (I) contains at least Nb (niobium), the piezoelectric ceramic sputtering target is composed of a plurality of crystal grains; and the average particle diameter of the crystal grains is larger than 3 μm and not larger than 30 μm.
Piezoelectric ceramic sputtering target, lead-free piezoelectric thin film and piezoelectric thin film element using the same
AZUMA TOMOHISA (Autor:in) / NANAO MASARU (Autor:in) / ISHII KENTA (Autor:in)
30.06.2020
Patent
Elektronische Ressource
Englisch
IPC:
H10N
/
B32B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
,
Schichtkörper, d.h. aus Ebenen oder gewölbten Schichten, z.B. mit zell- oder wabenförmiger Form, aufgebaute Erzeugnisse
/
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
| Europäisches Patentamt | 2017
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