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POROUS CERAMIC, MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, SHOWER PLATE AND PLUG
A porous ceramic of the present disclosure contains yttrium zirconate and yttrium oxide, and at least one of them is a main component. A member for a semiconductor manufacturing apparatus such as a shower plate, a plug or the like in a semiconductor manufacturing apparatus is made of the above porous ceramic.
POROUS CERAMIC, MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, SHOWER PLATE AND PLUG
A porous ceramic of the present disclosure contains yttrium zirconate and yttrium oxide, and at least one of them is a main component. A member for a semiconductor manufacturing apparatus such as a shower plate, a plug or the like in a semiconductor manufacturing apparatus is made of the above porous ceramic.
POROUS CERAMIC, MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, SHOWER PLATE AND PLUG
MATSUFUJI HIROMASA (Autor:in)
09.12.2021
Patent
Elektronische Ressource
Englisch
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