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YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
A component of a plasma processing chamber having a coating on at least one surface that comprises yttrium aluminum. The coating is an aerosol deposited coating from a powder mixture of an yttrium oxide powder and an aluminum-containing powder and having an yttrium to aluminum ratio of 4:1 to 1:4 by molar number. The coating can be annealed to form a porous ternary oxide.
YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
A component of a plasma processing chamber having a coating on at least one surface that comprises yttrium aluminum. The coating is an aerosol deposited coating from a powder mixture of an yttrium oxide powder and an aluminum-containing powder and having an yttrium to aluminum ratio of 4:1 to 1:4 by molar number. The coating can be annealed to form a porous ternary oxide.
YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
XU LIN (Autor:in) / WETZEL DAVID JOSEPH (Autor:in) / SRINIVASAN SATISH (Autor:in) / KOSHY ROBIN (Autor:in) / KERNS JOHN MICHAEL (Autor:in) / DAUGHERTY JOHN (Autor:in)
23.03.2023
Patent
Elektronische Ressource
Englisch
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