Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Yttrium Aluminum Silicate Glass Ceramic Coating For Semiconductor Chamber Apparatus
Articles may be protected against halide plasma, by applying a rare earth-containing glaze to the surface of the article. The glaze may be a coating comprising; 20 to 90 mol % SiO2, 0 to 60 mol % Al2O3, 10 to 80 mol % rare earth oxides and/or rare earth fluorides (REX), wherein SiO2+Al2O3+REX≥60 mol %.
Yttrium Aluminum Silicate Glass Ceramic Coating For Semiconductor Chamber Apparatus
Articles may be protected against halide plasma, by applying a rare earth-containing glaze to the surface of the article. The glaze may be a coating comprising; 20 to 90 mol % SiO2, 0 to 60 mol % Al2O3, 10 to 80 mol % rare earth oxides and/or rare earth fluorides (REX), wherein SiO2+Al2O3+REX≥60 mol %.
Yttrium Aluminum Silicate Glass Ceramic Coating For Semiconductor Chamber Apparatus
LEE CHENGTSIN (Autor:in)
22.08.2019
Patent
Elektronische Ressource
Englisch
Yttrium aluminum silicate glass ceramic coating for semiconductor chamber apparatus
| Europäisches Patentamt | 2022
YTTRIUM ALUMINUM SILICATE GLASS CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPARATUS
| Europäisches Patentamt | 2018
YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
| Europäisches Patentamt | 2023
| British Library Online Contents | 2015
PLASMA RESISTANT YTTRIUM ALUMINUM OXIDE CHAMBER COMPONENTS
| Europäisches Patentamt | 2024