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Sputtering target, transparent conductive film and transparent electrode

YANO KOKI / INOUE KAZUYOSHI / TANAKA NOBUO

A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.

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Sputtering target, transparent conductive film and transparent electrode

YANO KOKI / INOUE KAZUYOSHI / TANAKA NOBUO

A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.

Sputtering target, transparent conductive film and transparent electrode

YANO KOKI / INOUE KAZUYOSHI / TANAKA NOBUO

A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.

Zugriff

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

Sputtering target, transparent conductive film and transparent electrode

Beteiligte:

YANO KOKI (Autor:in) / INOUE KAZUYOSHI (Autor:in) / TANAKA NOBUO (Autor:in)

Erscheinungsdatum:

01.12.2015

Medientyp:

Patent

Format:

Elektronische Ressource

Sprache:

Englisch

Klassifikation:

IPC: H01B CABLES , Kabel / C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL

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