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Sputtering target, transparent conductive film and transparent electrode
A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.
Sputtering target, transparent conductive film and transparent electrode
A sputtering target including indium, tin, zinc and oxygen, and including a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound.
Sputtering target, transparent conductive film and transparent electrode
YANO KOKI (author) / INOUE KAZUYOSHI (author) / TANAKA NOBUO (author)
2015-12-01
Patent
Electronic Resource
English
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