Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Abstract Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.
Abstract Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.
Thin Film Deposition by Laser Ablation
Duley, W. W. (Autor:in)
01.01.1996
12 pages
Aufsatz/Kapitel (Buch)
Elektronische Ressource
Englisch
Laser Ablation and Application to Thin Film Deposition
Springer Verlag | 1996
|Thin-film deposition by laser ablation of dimethylpolysiloxane
British Library Online Contents | 2002
|Tantalum oxide film deposition by laser ablation
British Library Online Contents | 1994
|Synthesis of BiFeO~3 Ceramic Targets and Thin Film Deposition by Laser Ablation
British Library Online Contents | 2006
|Characterization of rear- and front-side laser ablation plasmas for thin-film deposition
British Library Online Contents | 2002
|