Thin Film Deposition by Laser Ablation: Fid-Bau Portal

Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

Thin Film Deposition by Laser Ablation

Duley, W. W.

Abstract Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.

Access

Check availability in my library

Order at Subito €

Page navigation

Document information

Export, share and cite

Thin Film Deposition by Laser Ablation

Duley, W. W.

Abstract Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.

Thin Film Deposition by Laser Ablation

Duley, W. W.

Abstract Most refractory materials can be deposited in thin film form by laser sputtering or ablation of precursor solids. Ablation of solids using UV excimer laser radiation can yield high deposition rates, deposition of monolayers and stoichiometric deposits. This paper summarizes available data on the deposition of a variety of non metallic solids using laser ablation. Mechanisms involved in the deposition of diamond-like carbon films are discussed as a special case.

Access

Check availability in my library

Order at Subito €

Page navigation

Document information

Export, share and cite

Document information

Title:

Thin Film Deposition by Laser Ablation

Contributors:

Duley, W. W. (author)

Published in:

Laser Processing: Surface Treatment and Film Deposition ; 739-750

NATO ASI Series ; 307

Publication date:

1996-01-01

Size:

12 pages

ISBN:

978-94-009-0197-1 , 978-94-010-6572-6

ISSN:

DOI:

https://doi.org/10.1007/978-94-009-0197-1_39

Type of media:

Article/Chapter (Book)

Type of material:

Electronic Resource

Language:

English

Keywords:

Physics , Physics, general , Surfaces and Interfaces, Thin Films , Optics, Lasers, Photonics, Optical Devices , Characterization and Evaluation of Materials

Similar titles

Thin-film deposition by laser ablation of dimethylpolysiloxane

Okoshi, M. / Kuramatsu, M. / Inoue, N. | British Library Online Contents | 2002

Laser Ablation and Application to Thin Film Deposition

Catherinot, A. / Angleraud, B. / Aubreton, J. et al. | Springer Verlag | 1996

Tantalum oxide film deposition by laser ablation

Nishimura, Y. / Hiroki, U. / Ochiai, T. et al. | British Library Online Contents | 1994

Synthesis of BiFeO~3 Ceramic Targets and Thin Film Deposition by Laser Ablation

Mardare, C. C. / Tavares, P. B. / Mardare, A. I. et al. | British Library Online Contents | 2006

Characterization of rear- and front-side laser ablation plasmas for thin-film deposition

Escobar-Alarcon, L. / Camps, E. / Haro-Poniatowski, E. et al. | British Library Online Contents | 2002