Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Nanostructure Fabrication II
Abstract In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.
Nanostructure Fabrication II
Abstract In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.
Nanostructure Fabrication II
Prof. Cleland, Andrew N. (Autor:in)
01.01.2003
12 pages
Aufsatz/Kapitel (Buch)
Elektronische Ressource
Englisch
Springer Verlag | 2003
|Plasma-Assisted Approaches in Inorganic Nanostructure Fabrication
British Library Online Contents | 2010
|Nanostructure fabrication process for optoelectronic applications [4098-09]
British Library Conference Proceedings | 2000
|Facile fabrication of a dual hierarchical TiO2 nanostructure
British Library Online Contents | 2012
|Fabrication of TiO"2 hollow fibers with surface nanostructure
British Library Online Contents | 2011
|