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    Nanostructure Fabrication II

    Abstract In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.

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    Nanostructure Fabrication II

    Abstract In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.

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    Nanostructure Fabrication II

    Abstract In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.

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    Title:

    Nanostructure Fabrication II

    Contributors:

    Prof. Cleland, Andrew N. (author)

    Published in:

    Foundations of Nanomechanics ; 395-406

    Advanced Texts in Physics

    Publication date:

    2003-01-01

    Size:

    12 pages

    ISBN:

    978-3-662-05287-7 , 978-3-642-07821-7

    ISSN:

    1439-2674

    DOI:

    https://doi.org/10.1007/978-3-662-05287-7_11

    Type of media:

    Article/Chapter (Book)

    Type of material:

    Electronic Resource

    Language:

    English

    Keywords:

    Silicon Nitride , Nitride Film , Sacrificial Layer , Etch Mask , Suspended Structure Engineering , Mechanical Engineering , Mechanics , Nanotechnology and Microengineering , Nanotechnology , Theoretical and Applied Mechanics

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