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Thin Aluminum Oxide Films as Electrical Barriers Between Superconducting Y-Ba-Cu-O Layers

Nivelle, M. J. M. E. / Häuser, B. / Keim, E. G. / Rogaila, H.

Abstract Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

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Thin Aluminum Oxide Films as Electrical Barriers Between Superconducting Y-Ba-Cu-O Layers

Nivelle, M. J. M. E. / Häuser, B. / Keim, E. G. / Rogaila, H.

Abstract Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

Thin Aluminum Oxide Films as Electrical Barriers Between Superconducting Y-Ba-Cu-O Layers

Nivelle, M. J. M. E. / Häuser, B. / Keim, E. G. / Rogaila, H.

Abstract Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

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Titel:

Thin Aluminum Oxide Films as Electrical Barriers Between Superconducting Y-Ba-Cu-O Layers

Beteiligte:

Nivelle, M. J. M. E. (Autor:in) / Häuser, B. (Autor:in) / Keim, E. G. (Autor:in) / Rogaila, H. (Autor:in)

Erschienen in:

Advances in Cryogenic Engineering Materials ; 467-471

An International Cryogenic Materials Conference Publication ; 36

Erscheinungsdatum:

01.01.1990

Format / Umfang:

5 pages

ISBN:

978-1-4613-9882-0 , 978-1-4613-9880-6

ISSN:

DOI:

https://doi.org/10.1007/978-1-4613-9880-6_60

Medientyp:

Aufsatz/Kapitel (Buch)

Format:

Elektronische Ressource

Sprache:

Englisch

Schlagwörter:

Scan Electron Microscopy Picture , Strontium Titanate , Metallic Aluminum , Auger Line , Thin Aluminum Oxide Film Chemistry , Biochemical Engineering , Characterization and Evaluation of Materials , Mechanical Engineering

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