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Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
3rd, International symposium on environmental economy and technology ; 2008 ; Saitama, Japan
2009-01-01
4 pages
Also known as ISEET 2008.
Conference paper
English
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