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    Maskless excimer laser induced projection patterning of InP in Cl~2 etch gas

    New search for: Heydel, R.
    New search for: Matz, R.
    New search for: Goepel, W.

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    Maskless excimer laser induced projection patterning of InP in Cl~2 etch gas

    New search for: Heydel, R.
    New search for: Matz, R.
    New search for: Goepel, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Maskless excimer laser induced projection patterning of InP in Cl~2 etch gas

    New search for: Heydel, R.
    New search for: Matz, R.
    New search for: Goepel, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Maskless excimer laser induced projection patterning of InP in Cl~2 etch gas

    Contributors:

    Heydel, R. (author) / Matz, R. (author) / Goepel, W. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 69 ; 38

    Publication date:

    1993-01-01

    Size:

    38 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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