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Oxidation of tantalum silicide thin films in an RF oxygen plasma
Oxidation of tantalum silicide thin films in an RF oxygen plasma
Oxidation of tantalum silicide thin films in an RF oxygen plasma
Gomez-San Roman, R. (author) / Perez-Casero, R. (author) / Perriere, J. (author) / Enard, J. P. (author)
APPLIED SURFACE SCIENCE ; 70/71 ; 479
1993-01-01
479 pages
Article (Journal)
Unknown
DDC:
621.35
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