A platform for research: civil engineering, architecture and urbanism
Investigation of stability of GaAs metal/electron/semiconductor field effect transistor gate contacts by high resolution transmission electron microscopy analysis
Investigation of stability of GaAs metal/electron/semiconductor field effect transistor gate contacts by high resolution transmission electron microscopy analysis
Investigation of stability of GaAs metal/electron/semiconductor field effect transistor gate contacts by high resolution transmission electron microscopy analysis
Labat, N. (author) / Danto, Y. (author) / Plano, B. (author) / Chambon, M. (author)
1993-01-01
33 pages
Article (Journal)
Unknown
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
GaAs metal-semiconductor field effect transistor with InGaP/GaAs multiquantum barrier buffer layer
British Library Online Contents | 2000
|High-Resolution-Electron-Microscopy Investigation of Nanosize Inclusions
British Library Online Contents | 1997
|Molybdenum nitride nanoparticles — high-resolution transmission electron microscopy study
British Library Online Contents | 2007
|British Library Online Contents | 1999
|