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    Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions

    New search for: Ellmer, K.
    New search for: Kudella, F.
    New search for: Mientus, R.
    New search for: Schieck, R.

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    Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions

    New search for: Ellmer, K.
    New search for: Kudella, F.
    New search for: Mientus, R.
    New search for: Schieck, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions

    New search for: Ellmer, K.
    New search for: Kudella, F.
    New search for: Mientus, R.
    New search for: Schieck, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions

    Contributors:

    Ellmer, K. (author) / Kudella, F. (author) / Mientus, R. (author) / Schieck, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 70/71 ; 707

    Publication date:

    1993-01-01

    Size:

    707 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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