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Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions
Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions
Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions
Ellmer, K. (Autor:in) / Kudella, F. (Autor:in) / Mientus, R. (Autor:in) / Schieck, R. (Autor:in)
APPLIED SURFACE SCIENCE ; 70/71 ; 707
01.01.1993
707 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
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