Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride: Fid-Bau Portal

Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride

Cheng, W. S. / Lee, C. Y.

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Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride

Cheng, W. S. / Lee, C. Y.

Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride

Cheng, W. S. / Lee, C. Y.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride

Contributors:

Cheng, W. S. (author) / Lee, C. Y. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 13 ; 1204

Publication date:

1994-01-01

Size:

1204 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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