Structure and dielectric characterization of a chemically vapor deposited diamond thick film: Fid-Bau Portal

Structure and dielectric characterization of a chemically vapor deposited diamond thick film

Alam, M. / Lucero, A.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Structure and dielectric characterization of a chemically vapor deposited diamond thick film

Alam, M. / Lucero, A.

Structure and dielectric characterization of a chemically vapor deposited diamond thick film

Alam, M. / Lucero, A.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Structure and dielectric characterization of a chemically vapor deposited diamond thick film

Contributors:

Alam, M. (author) / Lucero, A. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 27 ; 81

Publication date:

1994-01-01

Size:

81 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

Gan, B. / Ahn, J. / Zhang, Q. et al. | British Library Online Contents | 2002

Investigations of Ta film resistors on chemically vapor deposited diamond plates

Zhu, X.-D. / Wang, H. / Zhan, R.-J. et al. | British Library Online Contents | 1999

Micromechanical characterization of chemically vapor deposited ceramic films

Grow, J. M. / Levy, R. A. | British Library Online Contents | 1994

Processing and characterization of alumina thin films on chemically vapor deposited diamond substrates for producing adherent metallizations

Menon, E. S. K. / Dutta, I. | British Library Online Contents | 1999

Self-bonding of chemically vapor deposited SiC articles

CHAND ALINA / CHAND RONALD H / DIPIETRO STEPHEN G et al. | European Patent Office | 2016

Free access