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    Reduction of etching damage in the fabrication of quantum wires

    New search for: Yang, H. W.
    New search for: Hsieh, J. T.
    New search for: Hong, S. F.
    New search for: Hwang, H. L.
    New search for: Fornani, R.

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    Reduction of etching damage in the fabrication of quantum wires

    New search for: Yang, H. W.
    New search for: Hsieh, J. T.
    New search for: Hong, S. F.
    New search for: Hwang, H. L.
    New search for: Fornani, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Reduction of etching damage in the fabrication of quantum wires

    New search for: Yang, H. W.
    New search for: Hsieh, J. T.
    New search for: Hong, S. F.
    New search for: Hwang, H. L.
    New search for: Fornani, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Reduction of etching damage in the fabrication of quantum wires

    Contributors:

    Yang, H. W. (author) / Hsieh, J. T. (author) / Hong, S. F. (author) / Hwang, H. L. (author) / Fornani, R.

    Published in:

    2nd International Workshop on Expert Evaluation and Control of Compound Semiconductor Materials and Technologies ; 379

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 28

    Publication date:

    1994-01-01

    Size:

    379 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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